Organic electroluminescence device
A technology of organic light-emitting elements and inorganic thin film layers, which can be used in household components, electrical components, light-emitting materials, etc., and can solve problems such as low ability to hold electrons
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0190] A 120-nm-thick transparent electrode film made of ITO was formed as an anode layer on a transparent glass substrate having a thickness of 1.1 mm, a length of 25 mm, and a width of 75 mm. Hereinafter, the glass substrate and the anode layer are collectively referred to as a substrate.
[0191] Then, the substrate was ultrasonically cleaned with isopropanol, and then 2 After drying in a (nitrogen) atmosphere, it was washed with UV (ultraviolet ray) and ozone for 10 minutes.
[0192] Then, the substrate was arranged in a tank of a sputtering apparatus, and a target (composition ratio 10:1) composed of tin oxide and ruthenium oxide (composition ratio 10:1) constituting the inorganic thin film layer was set in the tank.
[0193] Furthermore, an inorganic thin film layer is formed in a sputtering apparatus. In sputtering gas, Ar: 30sccm, O 2 : 5sccm, substrate temperature: 120°C, film formation speed 1nm / min, operating pressure 0.2-2Pa, and input power 300W, sputtering is ...
Embodiment 2
[0202] When forming an inorganic thin film layer, in addition to using GeO 2 A device was produced in the same manner as in Example 1 except for the target. Au particles of a predetermined size were arranged on this target to form a high-resistance inorganic hole injection layer with a film thickness of 7 nm.
[0203] The sputtering gas at this time is Ar: 30 sccm, O 2 : 5 sccm, room temperature (25°C), film formation rate 1nm / min, operating pressure 0.2-2Pa, input power 500W.
Embodiment 3
[0205] An element was produced in the same manner as in Example 1, except that a target composed of Si oxide and Ir oxide (composition ratio 10:1) was used for producing the inorganic thin film layer. An inorganic thin film layer with a film thickness of 7 nm was formed.
[0206] The sputtering gas at this time is Ar: 30 sccm, O 2 : 10sccm, at room temperature, film formation rate 1nm / min, operating pressure 0.2-2Pa, input power 400W.
PUM
| Property | Measurement | Unit |
|---|---|---|
| electron work function | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 