Substrates treating device

A substrate processing device and substrate technology are applied in the directions of transportation and packaging, lighting and heating equipment, cleaning methods and appliances, etc., which can solve problems such as increased floor space, high cost, and complex mechanisms, and achieve reduced floor space, Effect of equipment cost reduction

Inactive Publication Date: 2006-08-02
DAINIPPON SCREEN MTG CO LTD
View PDF2 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] However, in the substrate processing apparatus using the above-mentioned substrate posture changing device, in order to change the substrate from the horizontal posture to the inclined posture, a complicated mechanism is required (see FIG. 2 of Patent Document 2, etc.), and the cost is also increased.
In addition, since this substrate posture changing device is added and installed on the substrate conveyance path, the floor area required for installing the substrate processing device will inevitably increase.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Substrates treating device
  • Substrates treating device
  • Substrates treating device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0035] figure 1 It is a plan view schematically showing the substrate processing apparatus according to the first embodiment of the present invention. Figure 2 is a representation seen from all sides figure 1 A schematic diagram of the substrate processing apparatus shown, Figure 2A It is a side view showing the conveying direction changing part starting from the first processing part, Figure 2B It is a side perspective view of the conveying direction changing part, Figure 2C It is a side view showing the conveyance direction changing part from the 2nd processing part.

[0036] The substrate processing apparatus 10 according to this embodiment is an apparatus for performing a series of preset processes on a substrate B, such as figure 1 As shown, there are: in the direction of the substrate B to be carried out from the substrate storage box C figure 1 The first processing unit 20 that implements a series of processes on the substrate B while being transported in the ri...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

This invention is to provide a substrate processing apparatus which contributes to reduction of costs for equipment by reducing a floor surface required for installation and carrying a board in an inclined posture by a simple mechanism. After the board is treated by a first treatment part 20, a carrying direction changing part 40 changes the carrying direction of the substrate, and its inclined carrying part 49 carries the substrate to a second carrying path 43 nearly keeping the inclined posture made by the inclination of the first carrying path 41. A liquid supplying part supplies a treatment liquid to the main surface of the substrate B carried by the inclined carrying part 49. The second carrying path 43 and a second treatment part 30 treats the substrate whose inclined posture is kept by the inclined carrying part 49, by carrying the substrate in a direction reverse to the first treatment part 20 without changing the posture.

Description

technical field [0001] The present invention relates to a manufacturing process used in a liquid crystal display device, a PDP (plasma display panel: plasma display), or various semiconductor devices. A substrate processing apparatus that performs predetermined processing on various substrates such as substrates. Background technique [0002] Conventionally, there is known a substrate processing apparatus in which, for example, as shown in Patent Document 1, each processing section is arranged in a substantially "U" shape in plan view, and performs resist coating processing, exposure processing, and development processing on a substrate. Wait for a series of preset treatments. This substrate processing apparatus has: a first transport path 51 for applying a predetermined process while transporting a substrate taken out of a substrate storage box in one direction; Turning path 53; the second conveying path 52 that applies a predetermined process to the substrate while conve...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/677H01L21/00B08B3/02B65G49/06
CPCG03F7/16G03F7/3042G03F7/3064G03F7/70733G03F7/70775H01L21/6715H01L21/67706
Inventor 小田裕史川根旬平
Owner DAINIPPON SCREEN MTG CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products