Nano SiO2 grinding material polishing fluid for electronic glass

Abstract

The invention relates to a nanometer SiO2 abradant polishing fluid of the electronic glass which the weight ratio is the abradant and the SiO2 hydrosol 20-45%, the composite alkali 0.5-5.5%, the penetrant 1.0-10%, the surface active agent 1.0-10%, the de-ionized water residuum. The polishing fluid uses the SiO2 hydrosol as the base abradant and adjust the pH to 10.5-13.5 by the composite alkali formed by the KOH and the organic base. So the SiO2 has the good stability.

Description

technical field [0001] The invention relates to a chemical mechanical polishing liquid in the field of precision processing of electronic glass, in particular to a new type of chemical mechanical polishing liquid for global planar precision processing of electronic glass, that is, nano-SiO of electronic glass 2 Abrasive polishing fluid. Background technique [0002] At present, with the rapid development of the information industry, lenses, optical components (lenses, prisms), color TV glass shells, electronic glass for flat panel displays, and disk glass substrates all need to be planarized and precision processed globally. Therefore, the market for electronic glass polishing fluid The demand is increasing year by year. At present, rare earth oxides (mainly composed of CeO 2 ) abrasive polishing liquid to complete the glass polishing process. Micron or even nanometer CeO 2 During the polishing process, the polishing liquid of the abrasive is CeO in the initial stage of ...

AI Technical Summary

Problems solved by technology

But with CeO 2 Abrasive polishing liquid, due to its large abrasive particle size and poor particle size consistency, it is easy to scratch the glass in the CMP process, the roughness is large, and the CeO 2 The polishing liquid of the abrasive material has a high viscosity, and it is difficult to clean after CMP adsorption, resulting in a high scrap rate of electronic glass products, thus increasing the production cost

while SiO 2 Due to the low concentration of the aerosol polishing liquid, the polishing efficiency of the electronic glass is relatively low, which causes a high speed difference between the inside and outside of the electronic glass surface, causing the surface of the electronic glass to sag.

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