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TFT LCD array substrate structure and its producing method

A technology of array substrate structure and manufacturing method, which is applied in semiconductor/solid-state device manufacturing, optics, instruments, etc., can solve the problems of lower aperture ratio, reduce the jump voltage, reduce the probability of signal damage, and increase the aperture ratio Effect

Active Publication Date: 2007-04-11
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
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Problems solved by technology

Since the drain electrode is always in the pixel area, a part of the aperture ratio will always be sacrificed, resulting in a decrease in the aperture ratio. Usually, the way to increase the aperture ratio is to compress the area of ​​other parts to increase the aperture ratio.

Method used

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  • TFT LCD array substrate structure and its producing method
  • TFT LCD array substrate structure and its producing method
  • TFT LCD array substrate structure and its producing method

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Embodiment Construction

[0042]FIG. 3 is a top view of a specific embodiment of the structure of the TFT LCD array substrate of the present invention. As shown in FIG. 3 , the array substrate of the TFT LCD has a set of gate scanning lines 1 and a common electrode 13 parallel to it, and a set of data scanning lines 5 perpendicular to it. Adjacent gate scan lines 1 and data scan lines 5 define pixel regions. Each pixel includes a TFT switching device, a transparent pixel electrode 10 and a part of a common electrode 13 . As shown in FIG. 3 a , the TFT device is composed of a gate electrode 2 , a gate electrode insulating layer 4 , an active layer 3 , and a source electrode 6 and a drain electrode 7 . The transparent pixel electrode 10 is connected to the drain electrode 7 of the TFT through the passivation layer via hole 9 . The above part is the same as a conventional TFT pixel structure. The difference in the pixel structure of the TFT LCD of the present invention is that the present invention has...

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Abstract

This invention provides a TFT LCD array base plate structure including a base plate, a light strip, a grid insulation layer, a data scanning line, a film transistor, a passivation layer and its trough hole or groove formed on the drain of the film transistor, a pixel electrode formed on the passivation layer connected with the drain via the through hole or the groove, in which, the light strip is placed around the pixel electrode. This invention also provides a manufacturing method for the TFT LCD array base plate structure, which forms a close light strip around the pixel electrode the same time when forming grid scanning lines.

Description

technical field [0001] The present invention relates to a thin film transistor liquid crystal display (TFT LCD), in particular to a thin film transistor liquid crystal display array substrate structure and a manufacturing method thereof. Background technique [0002] Among flat-panel display technologies, TFT LCD has the characteristics of low power consumption, relatively low manufacturing cost, and no radiation, thus occupying a dominant position in the flat-panel display market. The TFT LCD device is formed by assembling an array glass substrate and a color filter glass substrate. As shown in FIG. 1 , it is a schematic cross-sectional view of the current mainstream amorphous silicon TFT (thin film transistor) structure and a top view of a single pixel. It is a bottom gate structure using back channel etching. As shown in the figure, the array structure includes: a set of gate scan lines 1 and a set of data scan lines 5 perpendicular thereto, and adjacent gate scan lines...

Claims

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Application Information

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IPC IPC(8): H01L27/12H01L23/522H01L21/84H01L21/768G02F1/136
CPCH01L27/1214G02F1/136227H01L27/124H01L27/1248
Inventor 明星张弥
Owner BOE TECH GRP CO LTD
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