Hartman wave front sensor to realize alignment function by light splitter and testing method thereof

A spectroscopic device and sensor technology, which is applied in the field of precision instruments and Hartmann wavefront sensors, can solve problems such as the deviation of the measured beam from the optical axis of the system, the increase in the error of wave surface measurement, and the difficulty of adjusting the incident wave front, etc. The effects of measurement accuracy, reduced requirements, and small detection errors

Inactive Publication Date: 2007-05-16
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

Compared with the incident light path, the measurement field of view of the microlens array is usually very small, and the light spot in the sub-aperture will shift greatly when the measured object changes a small angle, so it is difficult to adjust the incident wavefront into the micro Measuring Field of View of Lens Array
Therefore, in the process of using the Hartmann wavefront sensor, too much energy is spent on alignment; and it is easy to cause the measured beam to deviate from the optical axis of the system, resulting in a larger measurement error of the wavefront

Method used

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  • Hartman wave front sensor to realize alignment function by light splitter and testing method thereof
  • Hartman wave front sensor to realize alignment function by light splitter and testing method thereof
  • Hartman wave front sensor to realize alignment function by light splitter and testing method thereof

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Embodiment Construction

[0017] When the Hartmann wavefront sensor is working, the error of the system itself needs to be calibrated first.

[0018] As shown in Figure 1, when calibrating the system error, the light beam emitted by the measurement light source system 6 first passes through the beam splitter 3, then passes through the front mirror group 1 and rear mirror group 2 of the beam matching system, and finally exits the system. After being reflected by the standard plane mirror 7, it returns to the system, passes through the beam matching system, the beam splitter 3, and the microlens array 4, and forms an image on the photodetector 5. The position of the standard flat mirror 7 is adjusted to finally make the spot arrangement on the photodetector 5 meet the measurement requirements. But the area of ​​microlens array 4 is about 1cm 2 , is very small compared to the overall optical path, resulting in a small adjustable range of the standard plane mirror 7, and the adjustment is very difficult. ...

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Abstract

This invention relates to one Hageman wave sensor and its test method to realize calibration function, which adds rough and accurate calibration parts in traditional system, wherein, the rough part comprises the image screen with holes, split parts, rough calibration detection system and accurate calibration part comprises focus lens, accurate calibration split lens and detection system. After incidence beam through rough and accurate calibration steps, it rapidly enters micro lens measurement field to improve Hageman system measurement accuracy.

Description

technical field [0001] The invention relates to a Hartmann wavefront sensor, a precision instrument for measuring the shape of the wavefront, in particular to a Hartmann sensor that can simply, quickly and accurately adjust the self-collimated beam or the measured beam to enter the measurement field of view. wavefront sensor. Background technique [0002] The Hartmann wavefront sensor is an instrument that can detect the wavefront shape, and it has been widely used in optical mirror detection, medical instruments and celestial object imaging. In the previous Hartmann wavefront sensor, it usually only includes a measurement light source system, a beam matching system, a microlens array, a photodetector (usually a CCD) and a data processing system. Before the Hartmann wavefront sensor is used, the measured wavefront must be adjusted within the measurement field of view of the microlens array; in the past, the adjustment was made by observing the spot position in the sub-apert...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01M11/00G01M11/02G01M19/00G01J9/00G01B11/00G02B27/10G02B27/00G02B7/02G01M99/00
Inventor 李华强饶学军姜文汉鲜浩杨泽平饶长辉
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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