TFT array semi-exposure photoetching technology
A lithography process and semi-exposure technology, which is applied in photosensitive material processing, micro-lithography exposure equipment, and photolithography exposure equipment, etc., can solve the problems of high production cost and large number of processes, so as to increase production capacity and shorten the production time. The effect of process time and cost saving
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[0011] Hereinafter, preferred embodiments of the present invention are given in conjunction with the drawings to illustrate the technical solutions of the present invention in detail.
[0012] As shown in Figures 1a-1d, a TFT array half-exposure photolithography process, a photomask with a size lower than the critical resolution of the exposure equipment is set at the position of the thin film transistor channel, and the semiconductor film and the metal film are formed. A photolithography process is performed on the layer of the substrate.
[0013] After the first wet etching of the metal film layer and the dry etching of the semiconductor, the remaining photoresist in the previous step is etched to remove the residual photoresist in the channel part, and then the metal film layer is second Times wet engraving.
[0014] For a glass substrate that has a gate pattern and has formed a semiconductor film layer and a metal film layer, it goes through the cleaning process before photore...
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