Lead frame and semiconductor device using the same
a technology of lead frame and semiconductor device, applied in the direction of semiconductor device, semiconductor/solid-state device details, electrical apparatus, etc., can solve the problem of easy separation and achieve the effect of preventing separation, high joining strength and preventing separation
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first embodiment
[0053] FIGS. 1 to 3 show a lead frame 1 and a semiconductor device 10 in accordance with the invention. The lead frame 1 is produced using a thin plate made of a prescribed metal such as Cu alloy and 42 alloy, which is subjected to etching and is then subjected to die pressing, so that it is formed in a prescribed shape. Specifically, the lead frame 1 comprises a die stage 2 in which a semiconductor chip 8 is mounted on the upper surface, a plurality of stays 4 for supporting the die stage 2, and a plurality of leads 5 that are arranged outside of the die stage 2 and are electrically connected with electrodes of the semiconductor chip 8.
[0054] The die stage 2 is formed in a prescribed shape to match the shape of the semiconductor chip 8. In the present embodiment, the die stage 2 as a whole is roughly formed in a rectangular shape to match the rectangular shape of the semiconductor chip 8 as shown in FIGS. 2 and 3.
[0055] The overall area of the die stage 2 is reduced so as to be sm...
second embodiment
[0092]FIGS. 12A and 12B show the lead frame 1 and the semiconductor device 10 in accordance with the invention, wherein in addition to the foregoing cutouts 3 that are formed at the centers of the respective sides of the die stage 2, secondary cutouts 3A are formed so as to encompass the cutouts 3 inwardly of the die stage 2 whose backside is subjected to half etching.
[0093] Each of the secondary cutouts 3A is opened with respect to the cutouts 3 and the backside of the die stage 2, wherein in the foregoing molding step, the molded resin 9 flows into the secondary cutouts 3A in addition to the cutouts 3 of the die stage 2.
[0094] The second embodiment can offer the same effects as demonstrated by the first embodiment. In addition, due to the formation of the secondary cutouts 3A, the overall adhered area is reduced in the same plane formed between the backside of the die stage 2 and the molded resin 9 so that the stress therein is dispersed; hence, it is possible to make it difficul...
third embodiment
[0096]FIGS. 13A and 13B show the lead frame 1 and the semiconductor device 10 in accordance with the invention, wherein the secondary cutouts 3A are formed by performing half etching on the upper surface of the die stage 2 so as to encompass the semicircular cutouts 3, which are formed at the centers of the respective sides of the die stage 2.
[0097] The secondary cutouts 3A are opened in the cutouts 3 on the upper surface of the die stage 2, wherein in the foregoing molding step, the molded resin 9 is introduced into the secondary cutouts 3A in addition to the cutouts 3, so that the molded resin 9 partially formed inside of the secondary cutouts 3 is joined to the backside of the semiconductor chip 8.
[0098] The third embodiment can demonstrate the same effects as offered in the first embodiment, wherein due to the formation of the secondary cutouts 3A, it is possible to increase the overall contact area between the semiconductor chip 8 and the molded resin 9. In addition, the secon...
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