Magnetic recording medium, production process thereof, and magnetic recording and reproducing apparatus
a technology of which is applied in the field of magnetic recording medium, production process thereof, and magnetic recording and reproducing apparatus, can solve the problems of increasing the noise of the medium, the per-bit volume of the magnetic layer becomes excessively small, and the recording and reproduction characteristics of the medium may deteriorate, so as to achieve high-density recording and reproducing data, improve recording and reproduction characteristics and thermal stability
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example 1
[0146] A glass substrate (product of Ohara Inc., Japan, outer diameter: 2.5 inches), which had been washed, was placed in a film formation chamber of a DC magnetron sputtering apparatus (Model: C-3010, product of ANELVA, Japan), and the chamber was evacuated to 1×10−5 Pa. Thereafter, while the temperature of the substrate was maintained at 100° C. or less, a soft magnetic undercoat layer 2 (thickness: 100 nm) was formed on the glass substrate through sputtering by use of an 89Co4Zr7Nb (Co content: 89 at%, Zr content: 4 at%, Nb content: 7 at%) target. The product of the saturated magnetic flux density Bs (T) and thickness t (nm) of the layer 2; i.e., Bs·t (T·nm), was measured by use of a vibrating sample magnetometer (VSM), and was found to be 120 (T·nm).
[0147] Subsequently, the substrate was heated to 200° C., and an orientation-regulating layer 3 (thickness: 20 nm) was formed on the aforementioned soft magnetic undercoat layer 2 by use of an Ru target. Subsequently, an intermediat...
examples 2 through 11
[0149] The procedure of Example 1 was repeated, except that the perpendicular magnetic layer 5 was changed in its composition and thickness, to thereby produce magnetic recording media.
example 12
[0159] A glass substrate (product of Ohara Inc., outer diameter: 2.5 inches), which had been washed, was placed in a film formation chamber of a DC magnetron sputtering apparatus (Model: C-3010, product of ANELVA), and the chamber was evacuated to 1×10−5 Pa. Thereafter, while the temperature of the substrate was maintained at 100° C. or less, a soft magnetic undercoat layer 2 (thickness: 100 nm) was formed on the glass substrate through sputtering by use of an 89Co4Zr7Nb target. The product of the saturated magnetic flux density Bs (T) and thickness t (nm) of the layer 2; i.e., Bs·t (T·nm), was measured by use of a vibrating sample magnetometer (VSM), and was found to be 120 (T·nm).
[0160] Subsequently, the substrate was heated to 200° C., and an orientation-regulating layer 3 (thickness: 20 nm) was formed on the aforementioned soft magnetic undercoat layer by use of an Ru target. Subsequently, an intermediate layer 4 (thickness: 5 nm) was formed by use of a 65Co30Cr5B target, and t...
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