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Polymerizable composition for stereolithography

a technology of polymerizable composition and stereolithography, which is applied in the direction of additive manufacturing apparatus, etc., can solve the problems of significantly low water solubility of radical polymerizable compound, achieve high water resistance, and easy to wash out with water

Active Publication Date: 2015-08-20
JNC CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The invention is a photopolymerizable composition that can be easily washed out with water and has high water resistance. It can be easily removed from a support, and can be easily cured by light rays. This composition allows for easy fabrication of objects using a lamination method that is versatile and can be performed in an ordinary home.

Problems solved by technology

However, such a specific radically polymerizable compound is significantly low in water solubility, and therefore use of an organic solvent such as acetone and isopropyl alcohol is needed for washing fabrication equipment.

Method used

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  • Polymerizable composition for stereolithography
  • Polymerizable composition for stereolithography
  • Polymerizable composition for stereolithography

Examples

Experimental program
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Effect test

example 1

[0064]As water-soluble radically polymerizable compound (A), NK Ester A-GLY-9E (trade name, Shin-Nakamura Chemical Co., Ltd., hereinafter, abbreviated as A-GLY-9E), as photopolymerization initiator (B), Lucirin TPO (trade name, BASF Japan Ltd., hereinafter, abbreviated as TPO) being 2,4,6-trimethylbenzoyl-diphenyl-phosphineoxide, and as ionic surfactant (C), NEOPELEX G-15 (trade name, Kao Corporation, hereinafter, abbreviated as G-15) being sodium dodecyl benzene sulfonate were mixed and dissolved with each other at a formulation described below, and then the resulting mixture was filtered with a membrane filter (5 μm) made of PTFE to prepare photopolymerizable composition 1.

(A) A-GLY-9E8.00g(B) TPO0.40g(C) G-150.084g

[0065]As a result of measuring a viscosity (at 25° C.) of photopolymerizable composition 1 using a cone-plate (E type) viscometer (TV-22, made by Toki Sangyo Co., Ltd., the same, hereinafter), the viscosity was 97 mPa·s.

example 2

[0066]Photopolymerizable composition 2 was prepared in a manner similar to Example 1 except that NK Ester A-GLY-20E (trade name, Shin-Nakamura Chemical Co., Ltd., hereinafter, abbreviated as A-GLY-20E) was used as water-soluble radically polymerizable compound (A) and a formulation ratio described below was applied.

(A) A-GLY-20E8.00g(B) TPO0.40g(C) G-150.084g

As a result of measuring a viscosity (at 25° C.) of photopolymerizable composition 2 using a cone-plate (E type) viscometer, the viscosity was 213 mPa·s.

example 3

[0067]Photopolymerizable composition 3 was prepared in a manner similar to Example 1 except that 4HBA (trade name, Nippon Kasei Chemical Co., Ltd., hereinafter, abbreviated as 4HBA) being 4-hydroxybutyl acrylate was used as water-soluble radically polymerizable compound (D) and a formulation ration described below was applied.

(A) A-GLY-20E5.00g(B) TPO0.40g(C) G-150.084g(D) 4HBA3.00g

As a result of measuring a viscosity (at 25° C.) of photopolymerizable composition 3 using a cone-plate (E type) viscometer, the viscosity was 28 mPa·s.

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Abstract

Provided is a highly versatile polymerizable composition that allows the fabrication equipment to be washed easily with water, allows the fabricated object to be removed easily from the support, and allows easy curing by application of light rays of 400 nm or higher, in optical 3D fabrication by lamination fabrication. A photopolymerizable composition for stereolithography containing a water-soluble radical polymerizable compound (A) represented by formula (1), a photopolymerization initiator (B) that generates radicals upon application of light rays of a wavelength of 400 nm or higher, and an ionic surfactant (C). In formula (1), R1 is an organic group of valence a, a is an integer of 2 or higher, and R2 is hydrogen or an alkyl having 1-6 carbon atoms.

Description

TECHNICAL FIELD[0001]The present invention relates to a radically polymerizable resin composition for fabrication preferable for use upon manufacturing a 3D fabricated object by an optical 3D fabrication method, and a 3D fabricated object manufactured using the resin composition.BACKGROUND ART[0002]A proposal has been recently made on an optical 3D fabrication method referred to as a lamination fabrication method, as a method for manufacturing a 3D fabricated object, in which a 3D fabricated object having a desired shape is manufactured by preparing original data obtained by slicing 3-dimensional CAD data of a product to seeming stack thin plates, and repeating a plurality of times a step of irradiating with light a thin film formed of a photocurable-resin composition using a radically polymerizable compound and a cationically polymerizable compound to cure the thin film. As equipment for manufacturing such a photofabricated object, a further inexpensive equipment puts on the market...

Claims

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Application Information

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IPC IPC(8): C08L33/14C08K5/42
CPCC08K5/41C08F2/50C08F2/48B33Y70/00C08F220/20C08F122/1006C08F222/102C08L33/14C08F222/103C08F220/54C08K5/42C08L2205/025
Inventor SUGIHARA, KATSUYUKIARAI, KUNIAKI
Owner JNC CORP
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