System and method based on multi-source deposition for fabricating perovskite film
a technology of multi-source deposition and perovskite, which is applied in the direction of chemical vapor deposition coating, vacuum evaporation coating, coating, etc., can solve the problems of insufficient robustness of existing techniques for fabricating perovskite films for bandgap engineering, doping control, and other advanced solar cell and optoelectronics applications
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example 1
[0050]There are two evaporation units, containing two BX2 sources, coupled to the bottom section of the chamber and placed in two zones, respectively, where the two BX2 compounds are S1═SnI2 and S2═PbI2; there is one evaporation unit containing AX=MAI, which is coupled to the side section of the chamber or to the bottom section of the chamber with a proper shield structure around it, as illustrated in FIG. 2 or 5. The evaporation rates are: R1=1 ML / rotation, R2=1 ML / rotation, and RMAI=0.5 ML / rotation. The zone area distribution is: A1=A2=0.5′ (A1+A2). The rotation speed is 2 Hz. The evaporation shutters for all the sources are open during deposition. After each rotation, the deposited film comprises the Pb—Sn mixed perovskite with stoichiometry balanced at 1:1 ratio: 0.5 ML MASnI3 / 0.5 ML MAPbI3. After one second, the film comprises two repeating unit layers, i.e., (0.5 ML MASnI3 / 0.5 ML MAPbI3) / (0.5 ML MASnI3 / 0.5 ML MAPbI3).
example 2
[0051]There are two evaporation units, containing two BX2 sources, coupled to the bottom section of the chamber and placed in two zones, respectively, where the two BX2 compounds are S1═SnI2 and S2═SnBr2; there is one evaporation unit containing AX=MAI, which is coupled to the side section of the chamber or to the bottom section of the chamber with a proper shield structure around it, as illustrated in FIG. 2 or 5. The evaporation rates are: R1=4 ML / rotation, R2=1 ML / rotation, and RMAI=2.5 ML / rotation. The zone area distribution is: A1=A2=0.5′ (A1+A2). The rotation speed is 3 Hz. The evaporation shutters for all the sources are open during deposition. After each rotation, i.e., the rotation of the substrate stage 208 / 508 around its central axis by 360°, the deposited film comprises the I—Br mixed perovskite with stoichiometry balanced at 13:2 ratio: 2 ML MASnI3 / 0.5 ML MASnIBr2. After one second, the film comprises 3 repeating unit layers, i.e., (2 ML MASnI3 / 0.5 ML MASnIBr2) / (2 ML MA...
example 3
[0052]There are three evaporation units, containing three source materials, coupled to the bottom section of the chamber and placed in three zones, respectively, where the two sources are BX2 compounds, S1═SnI2 and S2═SnBr2, and the third source is a non-volatile dopant source, S3═Bi(NO3)3 (or BiX3 where X═F, Cl, Br or I); there is one evaporation unit containing AX=FAI, which is coupled to the side section of the chamber or to the bottom section of the chamber with a proper shield structure around it, as illustrated in FIG. 2 or 5. The evaporation rates are: R1=2.7 ML / rotation, R2=2.7 ML / rotation, R3=0.6 ML / rotation, and RFAI=0.67 ML / rotation. The zone area distribution is: A1=A2=A3=0.33′ (A1+A2+A3). The rotation speed is 5 Hz. The evaporation shutters for all the sources are open during deposition. After each rotation, the deposited film comprises the I—Br mixed formamidinium perovskite with a 10% doping concentration of Bi with stoichiometry balanced at 2:1 ratio: 1 ML FASn0.9Bi0...
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