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Leakage current reduction in stacked metal-insulator-metal capacitors

a technology of metal-insulator metal capacitors and leakage current reduction, which is applied in the field of stacking metal-insulator-metal capacitors, can solve the problems of substantial power loss due to leakage current, difficult formation of high-density metal-insulator-metal capacitors (mimcaps), etc., and achieve the effect of reducing leakage curren

Active Publication Date: 2018-07-12
INT BUSINESS MASCH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This method significantly reduces leakage currents by forming barrier layers that increase the barrier height between electrodes and the conduction band of the insulator layer, enhancing capacitor performance and maintaining the resistivity of the metal layers.

Problems solved by technology

As semiconductor fabrication technologies improve, forming high-density metal-insulator-metal capacitors (MIMCAPs) becomes challenging.
Such high areas mean that leakage current must be reduced as much as possible, otherwise the power loss due to leakage currents will be substantial.

Method used

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  • Leakage current reduction in stacked metal-insulator-metal capacitors
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  • Leakage current reduction in stacked metal-insulator-metal capacitors

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Embodiment Construction

[0016]Embodiments of the present invention provide metal-insulator-metal capacitors (MIMCAPs) that make use of two metal layers with an insulator layer between them. During fabrication, the insulator layer is treated to reduce impurities and to introduce interstitial oxygen in the insulator layer. During subsequent processing steps (e.g., conventional back end of line (BEOL) processes), the interstitial oxygen is released by the insulator layer into the metal layers above and below. The oxygen reacts with the metal in the metal layers, forming barrier layers between the metal layers and the insulator layer.

[0017]These barrier layers have a higher work function than the metal layers and increase the barrier height between the electrodes and the conduction band of the insulator layer, resulting in lower leakage currents and, thus, superior capacitor performance. In addition, this process for forming the barrier layers does not compromise the resistivity of the metal layers.

[0018]It is...

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Abstract

Capacitors and methods of forming the same include forming a dielectric layer on a first metal layer. The dielectric layer is oxygenated such that interstitial oxygen is implanted in the dielectric layer. A second metal layer is formed on the dielectric layer. The dielectric layer is heated to release the interstitial oxygen and to oxidize the first and second metal layers at interfaces between the dielectric layer and the first and second metal layers.

Description

BACKGROUNDTechnical Field[0001]The present invention generally relates to stacked metal-insulator-metal capacitors and, more particularly, to the formation of barrier layers in such capacitors to reduce leakage currents.Description of the Related Art[0002]As semiconductor fabrication technologies improve, forming high-density metal-insulator-metal capacitors (MIMCAPs) becomes challenging. MIMCAPs are conventionally formed in between layers of a device, for example using a thin stack that covers a large area.[0003]To obtain a sufficiently high capacitance density (i.e., capacitance per unit area), three-dimensional capacitor structures are employed with high-k dielectric insulators. For example, three-electrode stacked capacitors have been implemented to address the challenge of providing high capacitance for decoupling capacitors.[0004]However, a large percentage of the chip area (e.g., up to about 95%) may need to be covered with such decoupling capacitors to achieve the total capa...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): H01L49/02H01L21/02H10N97/00
CPCH01L28/75H01L21/02186H01L21/02244H01L21/02323
Inventor ANDO, TAKASHIJAGANNATHAN, HEMANTHJAMISON, PAUL C.ROZEN, JOHN
Owner INT BUSINESS MASCH CORP