Dual beam microscope system for imaging during sample processing

Abstract

Methods for using a dual beam microscope system to simultaneously process a sample and image the processed portions of the sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, splitting the plurality of electrons into two electron beams, and then modifying the focal properties of at least one of the electron beams such that the two electron beams have different focal planes. Once the two beams have different focal planes, the first electron beam is focused such that it acts as a STEM beam. The STEM beam is then used to process a region of the sample to induce a physical change (e.g., perform milling, deposition, charge adjustment, phase change, etc.). The second electron beam is focused to act as a TEM beam to perform imaging of the region of the sample being processed

Description

BACKGROUND OF THE INVENTION[0001]Charged particle microscopes are used to perform many sample processing applications, including circuit editing, and materials analysis. However, with current charged particle microscope systems it is impossible to do real-time imaging during the sample processing. This inability to monitor the region of the sample being processed means that incidental growth / etching or processing errors are not able to be diagnosed and / or corrected until after the processing has been concluded. For example, depending on the sample composition and the atmosphere of the vacuum chamber, there may be incidental deposition, etching, and / or oxidation during sample processing, which the user is not aware of until the sample processing has stopped.[0002]This inability to monitor the sample as it is processed fundamentally limits the usefulness of charged particle microscopes for sample processing, as current users need to either accept inexact performance, or drastically re...

AI Technical Summary

Benefits of technology

The patent describes methods for processing samples using a combination of scanning electron microscopy (SEM) and transmission electron microscopy (TEM). These methods involve focusing an electron beam to create a TEM beam for real-time imaging of the sample. A beam blocker can be used to prevent interference from the SEM beam, and image processing techniques can be used to isolate the TEM beam and form a TEM image of the processed region of the sample. These methods enable improved accuracy and efficiency in analyzing samples and advancing the field of electron microscopy.

Problems solved by technology

However, with current charged particle microscope systems it is impossible to do real-time imaging during the sample processing.

This inability to monitor the region of the sample being processed means that incidental growth / etching or processing errors are not able to be diagnosed and / or corrected until after the processing has been concluded.

This inability to monitor the sample as it is processed fundamentally limits the usefulness of charged particle microscopes for sample processing, as current users need to either accept inexact performance, or drastically reduce throughput time by regularly halting sample processing to conduct imaging.

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