Process for synthesizing quartz glass by horizontal silicon tetrachloride vapor deposition
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- CHINA BUILDING MATERIALS ACAD
- Publication Date
- 2008-05-14
Smart Images
Figure 1 Figure 2 Figure 3
Abstract
Description
technical field
[0001] The invention relates to a method for synthesizing quartz glass by vapor phase deposition of silicon tetrachloride, in particular a method for synthesizing quartz glass by using an improved horizontal deposition furnace. Background technique
[0002] For a long time, in the horizontal production process used in the production of quartz glass, the deposition furnace has been a traditional horizontal furnace, as shown in Figure 1 and Figure 2. Inside the furnace body, there is a deposition mound surface fixed to the port of the foundation rod. The furnace body is open, with a chimney in the middle, a burner outside one end of the furnace body, and a foundation rod pierced through the other end. The foundation rod passes through one end of the furnace body and a Lathe connection; the synthesis of quartz glass is usually formed by accepting the burner cutting material on the deposition target surface. There are three problems in the setting of this horizo...