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Production method of synthetic silica glass ingot for large-size photomask substrates

A technology of synthetic quartz and production method, which is applied in glass production, glass molding, glass manufacturing equipment and other directions, can solve the problem that synthetic quartz glass ingots cannot grow normally, the growth efficiency of synthetic quartz glass ingots is low, and the feeding system cannot be stably supplied. and other problems to achieve the effect of avoiding unstable feeding, reducing energy consumption and improving growth efficiency.

Active Publication Date: 2016-12-14
HUBEI FEILIHUA QUARTZ GLASS
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  • Abstract
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  • Application Information

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Problems solved by technology

[0003] The purpose of the present invention is to provide a method that can effectively improve the deposition efficiency, reduce production energy consumption, and solve the problem that the waste gas of the existing process is deposited on the furnace wall and the flue wall, causing the feeding system to fail to feed materials stably, resulting in the synthesis of quartz glass ingots. The production method of synthetic quartz glass ingots for producing large-scale light-cured film substrates due to the low growth efficiency, which may even cause the problem that synthetic quartz glass ingots cannot grow normally

Method used

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  • Production method of synthetic silica glass ingot for large-size photomask substrates
  • Production method of synthetic silica glass ingot for large-size photomask substrates

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Embodiment Construction

[0024] First, the furnace of the vertical deposition furnace is preheated by the hydrogen-oxygen burner 1. The vertical deposition furnace is composed of a furnace body 2 and a furnace 3 made of refractory materials. An annular air duct 4 is arranged between the body of furnace 2, and the top of the annular air duct 4 is provided with a plurality of air outlets, and the bottom of the annular air duct 4 is provided with a plurality of air inlets; the furnace 3 is provided with a top cover, and the top cover A hydrogen-oxygen burner 1 is installed in the middle part, and a furnace mouth 5 is arranged on one side of the furnace, and the furnace mouth 5 communicates with the annular air duct 4 .

[0025] The total amount of hydrogen and oxygen gas in the preheating process of the hydrogen-oxygen burner 1 is gradually increased from 3.5 cubic meters per hour. The method of increase is to observe the furnace temperature, first quickly raise the temperature to 800°C, and then graduall...

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Abstract

The invention relates to a production method of a synthetic silica glass ingot for large-size photomask substrates, belonging to the technical field of silica glass production. Hydrogen and oxygen are combusted in a combustor to generate water vapor, and the water vapor reacts with gas silicon tetrachloride in the combustor tremie pipe to generate silica particles. The silica particles are deposited and molten on the stone roller surface of a vertical deposition furnace to form the silica glass ingot. The method enhances the deposition efficiency and lowers the production energy consumption. The method solves the following problems in the traditional vertical technique: excess waste gas can not be easily uniformly deposited on the furnace wall and flue wall, the long-time deposition can influence the draft quantity and cause incapability of normal growth of the synthetic silica glass ingot, the growth efficiency is low, and the feed system is not stable, causing incapability of implementing production of synthetic silica glass ingots for large-size photomask substrates. The method can produce the silica glass ingot of which the weight is 1000kg or above and the diameter is 700mm or above, the deposition rate can reach 800g / h, and the production efficiency is enhanced by 1.8-1.5 times.

Description

technical field [0001] The invention relates to a production method for producing a synthetic quartz glass ingot for a large-scale light pickling film substrate, belonging to the technical field of quartz glass production. Background technique [0002] At present, the quartz glass ingots used for the production of light pickling film substrates are synthesized by the traditional vertical process. After the deposition, the size of the draft will be affected, which will cause the feeding system to be unable to supply materials stably, resulting in low growth efficiency of the synthetic quartz glass ingot, and in severe cases, the synthetic quartz glass ingot cannot grow normally, resulting in the use of synthetic quartz glass ingots for large-scale optical film substrates. The production of quartz glass ingots cannot be broken through. Contents of the invention [0003] The purpose of the present invention is to provide a method that can effectively improve the deposition e...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03B20/00
CPCY02P40/57C03B20/00
Inventor 黄若杰欧阳葆华刘建元周轶刘志龙
Owner HUBEI FEILIHUA QUARTZ GLASS
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