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Target for transparent electroconductive film, transparent electroconductive material, transparent electroconductive glass, and transparent electroconductive film

A technology of transparent conductive material and transparent conductive glass, which is applied in the fields of targets for transparent conductive films, transparent conductive materials, transparent conductive glass and transparent conductive films, and can solve problems such as the transparency of transparent electrodes not meeting the requirements

Inactive Publication Date: 2009-04-22
IDEMITSU KOSAN CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, when this double-layer structure is used in a display device, the transparency of the transparent electrode still does not meet the requirements.

Method used

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  • Target for transparent electroconductive film, transparent electroconductive material, transparent electroconductive glass, and transparent electroconductive film
  • Target for transparent electroconductive film, transparent electroconductive material, transparent electroconductive glass, and transparent electroconductive film
  • Target for transparent electroconductive film, transparent electroconductive material, transparent electroconductive glass, and transparent electroconductive film

Examples

Experimental program
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Effect test

specific Embodiment approach

[0271] The present invention is described in more detail with reference to the following examples, but the present invention is not limited to these examples.

[0272] [First aspect of the present invention]

Embodiment I-1

[0274] (1) Manufacture of sintered sheet

[0275] Powders of indium oxide, tin oxide, and zinc oxide were used as raw materials, mixed in the following atomic ratio, fed into a wet ball mill, and mixed and ground for 72 hours.

[0276] In / (In+Sn+Zn)=0.50

[0277] Sn / (In+Sn+Zn)=0.25

[0278] Zn / (In+Sn+Zn)=0.25

[0279] After granulating the obtained ground material, it is pressed again into a sheet with a diameter of 4 inches and a thickness of 5 mm, which is then placed in a sintering furnace for pressure sintering at 1400° C. for 36 hours.

[0280] According to the sintered sheet obtained by this method, its density is 6.6g / cm 3 , and the bulk resistance is 0.95mΩ·cm.

[0281] Secondly, the crystallinity of the sintered sheet was confirmed by X-ray analysis. Indium oxide crystals and Indium oxide were formed in the sintered sheet. 2 o 3 (ZnO)m represents, and m is 4, 5, 7 crystals of hexagonal layered compounds of indium oxide and zinc oxide, and Zn 2 SnO 4 The main c...

Embodiment I-2

[0291] Except that the temperature of the glass substrate during sputtering in part (2) of Example I-1 was adjusted to 215° C., other steps were the same as in Example I-1 to produce transparent conductive glass.

[0292] The evaluation results of the transparent conductive film on the obtained transparent conductive glass are shown in Table I-2.

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Abstract

The invention includes sintered products for transparent electroconductive films, which are formed into films in a stable and efficient manner through sputtering or the like, sputtering targets of the sintered products, and transparent electroconductive glass and films formed from the targets. The transparent electroconductive glass and films have good transparency, good electroconductivity and good workability into electrodes, and are therefore favorable to transparent electrodes in organic electroluminescent devices as realizing good hole injection efficiency therein. The sintered products contain constituent components of indium oxide, tin oxide and zinc oxide in specific atomic ratios of the metal atoms, and optionally contain specific metal oxides of ruthenium oxide, molybdenum oxide, vanadium oxide, etc.

Description

[0001] This application entered China on June 30, 2000 (international application date: August 19, 1999), the application number is 99801982.8 (international application number: PCT / JP99 / 04453), and the title of the invention is "Target for transparent conductive film, A divisional application of the PCT international application for "transparent conductive materials, transparent conductive glass and transparent conductive film". technical field [0002] The present invention relates to a metal oxide sintered product which is very suitable as a material for a transparent conductive film in a display device etc., a film-forming target for forming a transparent conductive film obtained by using the sintered product, a transparent conductive material, and a material formed from the target Transparent conductive glass and transparent conductive film. Background technique [0003] In recent years, various display devices, such as liquid crystal display devices, electroluminescenc...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C04B35/01C04B35/453C23C14/34C04B35/00C01G15/00C04B35/457C04B35/495
Inventor 井上一吉
Owner IDEMITSU KOSAN CO LTD