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Manufacture method of high resolution self-supporting totally hollowed-out transmission grating

A high-resolution, transmission grating technology, applied in the direction of diffraction grating, photosensitive material processing, microlithography exposure equipment, etc., can solve the problems of inability to produce high aspect ratio graphics and low efficiency

Active Publication Date: 2009-06-17
SEMICON MFG INT (SHANGHAI) CORP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Electron beam fabrication can produce high-resolution patterns at the nanoscale, but is very inefficient and not capable of high-aspect-ratio patterns

Method used

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  • Manufacture method of high resolution self-supporting totally hollowed-out transmission grating
  • Manufacture method of high resolution self-supporting totally hollowed-out transmission grating
  • Manufacture method of high resolution self-supporting totally hollowed-out transmission grating

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Embodiment Construction

[0035] Black used in the drawings indicates opaque portions, and gray indicates translucent portions. It conforms to the usual representation method in the field of microelectronics technology.

[0036] 1. If Picture 1-1 As shown, a thin chromium and thin gold layer 103 is deposited on the self-supporting X-ray mask substrates 101 and 102 as an electroplating substrate; the thickness of the thin chromium and thin gold film 103 is 10 to 30 nm, and is obtained by electron beam evaporation. of;

[0037] 2. If Figure 1-2 As shown, an electron beam photoresist is cast on the surface of the thin chromium and thin gold layer 103, and electron beam lithography is performed to obtain a high-resolution grating pattern 104;

[0038] 3. If Figure 1-3 As shown, the grating pattern 104 is used as an electroplating mold, and the sheet is placed in a gold electroplating solution to electroplate an X-ray mask absorber gold pattern 105;

[0039] 4. If Figure 1-4 As shown, the electron...

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Abstract

This invention relates to one X ray infraction optical element high resolution rate self-supportive cast transparent grating, which comprises the following: a, depositing film gold layer to support X ray mask underlay; b, in surface layer etching electron glue to get etch pattern; c, the slice is put to coating liquid for X ray mode absorptive gold pattern; d, the said slice removes electron beam glue; e, then removing electron beam for film of chromium layer; f, coating medlin on glass for fixing; g, depositing gold on its surface; h, coating X ray etch glue on gold surface; I, removing medlin; j, removing etch glue; k, back surface erosion of glass to fulfill the process.

Description

technical field [0001] The invention relates to a manufacturing method of an X-ray diffraction optical element, a high-resolution self-supporting full hollow transmission grating. The X-ray diffraction optical element is mainly used for spectrum diagnosis in the X-ray band. It is characterized by the use of electron beam lithography to make an X-ray mask, and then replicate it by means of parallel X-ray lithography to make a self-supporting fully hollow transmission grating. This manufacturing method has high resolution and high production efficiency. High, stable process characteristics, has a strong practical value. Background technique [0002] The high-resolution self-supporting full-hollow transmission grating is a kind of convenient-to-use medium and high-level energy-resolving horizontal X-ray spectroscopic element, which is mainly used in the measurement of the radiation characteristics of extremely high-temperature materials. The traditional fabrication methods of ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18G03F7/20G03F7/26
Inventor 谢常青叶甜春
Owner SEMICON MFG INT (SHANGHAI) CORP
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