Method for improving alignment signal processing precision based on self-adapting correction treatment
Patent Information
- Authority / Receiving Office
- CN ยท China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
- Publication Date
- 2009-11-11
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Abstract
Description
technical field
[0001] The invention relates to a method for improving alignment signal processing accuracy based on adaptive correction processing, in particular to a method for improving alignment signal processing accuracy based on adaptive correction processing in an alignment system of a lithography equipment. Background technique
[0002] In industrial devices, due to the need for high precision and high productivity, a large number of detection devices and control systems for high-speed real-time measurement, signal sampling, data acquisition, data exchange, communication transmission and signal processing are distributed. These systems require us to use various methods to realize the control of detection, signal sampling control, data acquisition control, data exchange control, data transmission communication and signal processing. Devices that require detection signal processing and control include: integrated circuit manufacturing lithography equipment, flat panel ...