Manufacture method of high resolution self-supporting totally hollowed-out transmission grating

A high-resolution, transmission grating technology, applied in the field of X-ray diffraction optical elements, can solve the problems of low efficiency and inability to produce high aspect ratio graphics, etc.

Active Publication Date: 2007-08-15
SEMICON MFG INT (SHANGHAI) CORP +1
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  • Abstract
  • Description
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Problems solved by technology

Electron beam fabrication can produce high-resolution patterns at the nanoscale, but is very inefficient and not capable of high-aspect-ratio patterns

Method used

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  • Manufacture method of high resolution self-supporting totally hollowed-out transmission grating
  • Manufacture method of high resolution self-supporting totally hollowed-out transmission grating
  • Manufacture method of high resolution self-supporting totally hollowed-out transmission grating

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Embodiment Construction

[0034] Black used in the drawings indicates opaque portions, and gray indicates translucent portions. It conforms to the usual representation method in the field of microelectronics technology.

[0035] 1. As shown in Figure 1-1, a thin chromium and thin gold layer 103 is deposited on the self-supporting X-ray mask substrates 101 and 102 as an electroplating substrate; the thickness of the thin chromium and thin gold film 103 is 10 to 30 nm, which is Obtained by electron beam evaporation;

[0036] 2. As shown in Figure 1-2, apply an electron beam photoresist on the surface of the thin chromium and thin gold layer 103, and perform electron beam lithography to obtain a high-resolution grating pattern 104;

[0037] 3. As shown in Figure 1-3, using the grating pattern 104 as the electroplating mold, place the sheet in the gold electroplating solution to electroplate the X-ray mask absorber gold pattern 105;

[0038] 4. As shown in FIG. 1-4, the electron beam photoresist grating ...

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Abstract

This invention relates to one X ray infraction optical element high resolution rate self-supportive cast transparent grating, which comprises the following: a, depositing film gold layer to support X ray mask underlay; b, in surface layer etching electron glue to get etch pattern; c, the slice is put to coating liquid for X ray mode absorptive gold pattern; d, the said slice removes electron beam glue; e, then removing electron beam for film of chromium layer; f, coating medlin on glass for fixing; g, depositing gold on its surface; h, coating X ray etch glue on gold surface; I, removing medlin; j, removing etch glue; k, back surface erosion of glass to fulfill the process.

Description

technical field [0001] The invention relates to a manufacturing method of an X-ray diffraction optical element-a high-resolution self-supporting full-hollow transmission grating. The X-ray diffraction optical element is mainly used for spectrum diagnosis in the X-ray band. It is characterized by the use of electron beam lithography to make an X-ray mask, and then replicate it by means of parallel X-ray lithography to make a self-supporting fully hollow transmission grating. This manufacturing method has high resolution and high production efficiency. High, stable process characteristics, has a strong practical value. Background technique [0002] The high-resolution self-supporting full-hollow transmission grating is a kind of convenient-to-use medium and high-level energy-resolving horizontal X-ray spectroscopic element, which is mainly used in the measurement of the radiation characteristics of extremely high-temperature materials. The traditional fabrication methods of h...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/18G03F7/20G03F7/26
Inventor 谢常青叶甜春
Owner SEMICON MFG INT (SHANGHAI) CORP
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