Inductively coupled plasma reactor with multiple magnetic cores

Abstract

There is provided an inductively coupled plasma reactor (10). The inductively coupled plasma reactor is connected to a transformer (60) with multiple magnetic cores (41) and a primary winding (42), to transfer an electromotive force for plasma discharge to a plasma discharge chamber (21) of a reactor body. Parts of magnetic core positioned in side the plasma discharge chamber are protected by being entirely covered by a core protecting tube (45). The primary winding is electrically connected to a power supply source providing radio frequency power. In the inductively coupled plasma reactor, since a number of magnetic core cross sectional parts are positioned inside the plasma discharge chamber, the efficiency of transferring the inductively coupled energy to be connected with plasma is very high.

Description

technical field [0001] The invention relates to a plasma reactor, which generates active gas including ions, free radicals, atoms, and molecules through plasma discharge, and is used for plasma treatment of solids, powders, and gases with the active gas, specifically The statement relates to an inductively coupled plasma reactor combined with multiple magnetic cores. Background technique [0002] Plasma discharges are used for gas excitation, which is used to generate reactive gases including ions, radicals, atoms, and molecules. Reactive gases are widely used in many fields, and representative semiconductor manufacturing processes include etching, evaporation, and cleaning. [0003] Recently, wafers and LCD glass substrates used for manufacturing semiconductor devices have further increased in size. Therefore, there is a need for an easily diffused plasma source that has a high ability to control the energy of plasma ions and has a large-area processing capability. [00...

AI Technical Summary

Problems solved by technology

However, as the size of the non-processing substrate increases, the volume of the processing chamber also increases, and a plasma source that can sufficiently supply high-density active gas at a remote location is required.

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