Inductively coupled plasma reactor with multiple magnetic cores

A plasma and inductive coupling technology, which is applied in the fields of plasma, semiconductor/solid-state device manufacturing, circuits, etc., and can solve the problem of increasing the volume of the processing cavity.

Inactive Publication Date: 2007-10-31
NEW POWER PLASMA CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, as the size of the non-processing substrate increases, the volume of the processing chamber also increases, and a plasma source that can sufficiently supply high-density active gas at a remote location is required.

Method used

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  • Inductively coupled plasma reactor with multiple magnetic cores
  • Inductively coupled plasma reactor with multiple magnetic cores
  • Inductively coupled plasma reactor with multiple magnetic cores

Examples

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Embodiment 1

[0100] Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings, so that the plasma reactor with multiple discharge chambers of the present invention will be described in detail.

[0101] Fig. 1 is a perspective view of a plasma reactor according to a first embodiment of the present invention, and Fig. 2a and Fig. 2b are a front sectional view and a side sectional view of the plasma reactor in Fig. 1 .

[0102] A plasma reactor (10) according to a first embodiment of the present invention has a reactor main body (20) having a plurality of independent plasma discharge chambers (21). A transformer (40) is incorporated on the reactor body (20) for transferring electromotive force for plasma discharge to the plasma discharge chamber (21). The transformer (40) has a magnetic core (41) and a primary coil (42) arranged across the plasma discharge chamber (21). The part of the magnetic core (41) located inside the plasm...

Embodiment 2

[0126] 9 is a perspective view of a plasma reactor according to a second embodiment of the present invention, and FIG. 10 is a perspective view showing the main structure of the plasma reactor of FIG. 9 . Also, FIG. 11 is a partially exploded perspective view showing the inside of the plasma reactor of FIG. 9 .

[0127] The plasma reactor (100) of the 2nd embodiment of the present invention has reactor main body (110), and this reactor main body (110) constitutes plasma discharge chamber (113), has gas inlet (120) and gas outlet ( 121). The transformer (130) includes: two or more core cross-sections traversing the inside of the plasma discharge chamber (113); a magnetic core (131) having a part of the core located outside the plasma discharge chamber (113); and The primary coil (132) is wound on the magnetic core (131). The primary coil (132) is electrically connected to a power supply source (133) (see FIG. 13).

[0128] The power supply source (133) is configured using an...

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Abstract

There is provided an inductively coupled plasma reactor (10). The inductively coupled plasma reactor is connected to a transformer (60) with multiple magnetic cores (41) and a primary winding (42), to transfer an electromotive force for plasma discharge to a plasma discharge chamber (21) of a reactor body. Parts of magnetic core positioned in side the plasma discharge chamber are protected by being entirely covered by a core protecting tube (45). The primary winding is electrically connected to a power supply source providing radio frequency power. In the inductively coupled plasma reactor, since a number of magnetic core cross sectional parts are positioned inside the plasma discharge chamber, the efficiency of transferring the inductively coupled energy to be connected with plasma is very high.

Description

technical field [0001] The invention relates to a plasma reactor, which generates active gas including ions, free radicals, atoms, and molecules through plasma discharge, and is used for plasma treatment of solids, powders, and gases with the active gas, specifically The statement relates to an inductively coupled plasma reactor combined with multiple magnetic cores. Background technique [0002] Plasma discharges are used for gas excitation, which is used to generate reactive gases including ions, radicals, atoms, and molecules. Reactive gases are widely used in many fields, and representative semiconductor manufacturing processes include etching, evaporation, and cleaning. [0003] Recently, wafers and LCD glass substrates used for manufacturing semiconductor devices have further increased in size. Therefore, there is a need for an easily diffused plasma source that has a high ability to control the energy of plasma ions and has a large-area processing capability. [00...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/24H01L21/3205
CPCH01J37/321H01J37/32467H01J37/32669H01J37/32834H05H1/46H05H1/4652
Inventor 崔大圭
Owner NEW POWER PLASMA CO LTD
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