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122 results about "Plasmonic coupling" patented technology

Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamber

Embodiments of the present invention relate to apparatus for enhancing deposition rate and improving a plasma profile during plasma processing of a substrate. According to embodiments, the apparatus includes a tuning electrode disposed in a substrate support pedestal and electrically coupled to a variable capacitor. The capacitance is controlled to control the RF and resulting plasma coupling to the tuning electrode. The plasma profile and the resulting deposition rate and deposited film thickness across the substrate are correspondingly controlled by adjusting the capacitance and impedance at the tuning electrode.
Owner:APPLIED MATERIALS INC

Conditioning remote plasma source for enhanced performance having repeatable etch and deposition rates

Embodiments of the present disclosure generally relate to methods for conditioning an interior wall surface of a remote plasma generator. In one embodiment, a method for processing a substrate is provided. The method includes exposing an interior wall surface of a remote plasma source to a conditioning gas that is in excited state to passivate the interior wall surface of the remote plasma source, wherein the remote plasma source is coupled through a conduit to a processing chamber in which a substrate is disposed, and the conditioning gas comprises an oxygen-containing gas, a nitrogen-containing gas, or a combination thereof. The method has been observed to be able to improve dissociation / recombination rate and plasma coupling efficiency in the processing chamber, and therefore provides repeatable and stable plasma source performance from wafer to wafer.
Owner:APPLIED MATERIALS INC

Wafer bias drive for plasma source

A segmented chuck provides uniform processing of a workpiece (e.g., a wafer) with a plasma in a process chamber. The segmented chuck includes a segmented electrode having a plurality of sub-electrodes where the sub-electrodes are electrically isolated from one another by insulating connections and the segmented electrode defines a process surface that is adapted to receive the workpiece. The segmented chuck also includes a plurality of RF drivers for driving the sub-electrodes with RF biases, where the RF biases couple the workpiece with the plasma in the process chamber. By allowing the workpiece to be placed on the chuck, the coupling between the plasma and the workpiece is enhanced. By allowing the sub-electrodes to be independently driven by RF drivers, more uniform processing can be achieved with larger workpieces.
Owner:TOKYO ELECTRON LTD

Three-dimensional coherent plasmonic nanowire arrays for enhancement of optical processes

A plasmonic grating sensor having periodic arrays of vertically aligned plasmonic nanopillars, nanowires, or both with an interparticle pitch ranging from λ / 8−2λ, where λ is the incident wavelength of light divided by the effective index of refraction of the sample; a coupled-plasmonic array sensor having vertically aligned periodic arrays of plasmonically coupled nanopillars, nanowires, or both with interparticle gaps sufficient to induce overlap between the plasmonic evanescent fields from neighboring nanoparticles, typically requiring edge-to-edge separations of less than 20 nm; and a plasmo-photonic array sensor having a double-resonant, periodic array of vertically aligned subarrays of 1 to 25 plasmonically coupled nanopillars, nanowires, or both where the subarrays are periodically spaced at a pitch on the order of a wavelength of light.
Owner:THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY

Capacitive coupling plasma processing apparatus

ActiveUS20060118044A1High planar uniformityPrevent charging damageElectric discharge tubesSemiconductor/solid-state device manufacturingCapacitanceTarget surface
A capacitive coupling plasma processing apparatus includes a process chamber configured to have a vacuum atmosphere, and a process gas supply section configured to supply a process gas into the chamber. In the chamber, a first electrode and a second electrode are disposed opposite each other. An RF power supply is disposed to supply an RF power to the first or second electrode to form an RF electric field within a plasma generation region between the first and second electrodes, so as to turn the process gas into plasma. The target substrate is supported by a support member between the first and second electrodes such that a process target surface thereof faces the second electrode. A conductive functional surface is disposed in a surrounding region around the plasma generation region and grounded to be coupled with the plasma in a sense of DC to expand the plasma.
Owner:KIOXIA CORP +1

Arrays of inductive elements for minimizing radial non-uniformity in plasma

An arrangement for enabling local control of power delivery within a plasma processing system having a plasma processing chamber during processing of a substrate is provided. The arrangement includes a dielectric window and an inductive arrangement. The inductive arrangement is disposed above the dielectric window to enable power to couple with a plasma in the plasma processing system. The inductive arrangement includes a set of inductive elements, which provides the local control of power delivery to create a substantially uniform plasma in the plasma processing chamber.
Owner:LAM RES CORP

Multifunctional light-absorbing, scattering and transmitting spectrograph based on surface plasma wave

A multifunction spectrograph based on surface plasma wave consists of light source, modulation unit of incoming light, modulation unit of angle, sample conveying unit, sample electromagnetic coupling reactor, detection unit of emission light, detection unit of reflection light, data collection / management unit and temperature control unit. It is featured as coupling and resonating plasma at surface of incoming-light wave resultant sensing film by said spectrograph for making fade field at surface of said sensing film be intensified so as to excite scattered light by utilizing intensified fade field.
Owner:INST OF CHEM CHINESE ACAD OF SCI

Double-cavity excitation enhanced microwave plasma torch generation device

The invention relates to a double-cavity excitation enhanced microwave plasma torch generation device, and belongs to the technical field of microwave plasma. The device comprises a microwave magnetron, a circulator, a directional coupler, a microwave plasma coupling waveguide, a cylindrical waveguide, an igniter and a discharge tube. After the microwave magnetron, the circulator and the directional coupler are sequentially connected in series, the directional coupler is connected with the microwave plasma coupling waveguide. The cylindrical waveguide chamber is additionally arranged in the axial direction of the discharge tube perpendicular to a compression rectangular waveguide; a thermal resistance waveguide in the microwave plasma coupling waveguide effectively isolates the influence of thermal release of plasma discharge on a whole system; the igniter makes the whole system operated by a single person to complete a series of processes of ignition, excitation and maintenance, and the ignition success rate is close to 100% under the condition that the no-load output of a microwave source is low. Plasma torch afterglow with a larger volume action area can be obtained by increasing the maximum power of a plasma torch, so that the device can operate stably and reliably for a long time, and can be used in various relevant fields such as combustion assistance, nano material synthesis, waste gas treatment and high-temperature-resistant material surface modification.
Owner:李容毅

Arrangement for the suppression of particle emission in the generation of radiation based on hot plasma

The invention is directed to an arrangement for the suppression of particle emission in the generation of radiation based on hot plasma in x-ray radiation sources, particularly EUV radiation sources. The object of the invention, to find a novel possibility for debris filtering in plasma-coupled radiation sources which permits a reliable retention of charged and uncharged particles without substantially reducing transmission or limiting the usable solid angle of radiation, is met, according to the invention, by an arrangement for the suppression of particle emission with generation of radiation based on a hot plasma having a vacuum chamber for generating the plasma in that the outlet opening of the vacuum chamber is followed by means for generating an electric field, wherein the electric field is oriented orthogonal to the central propagation direction of a divergent beam bundle exiting in a defined solid angle, and means for generating a gas sink so that a resulting particle flow is oriented parallel to the direction of the electric field. The particle flow is advantageously further reinforced in the direction of the gas sink by an oppositely arranged gas supply device.
Owner:USHIO DENKI KK

Enhanced emission from plasmonic coupled emitters for solid state lighting

There is provided an illumination device (100) comprising an energy source (102) for exciting a photon emitter; a first wavelength conversion layer (104) and a second wavelength conversion layer (106). At least one of the first and second wavelength conversion layer comprises a periodic plasmonic antenna array comprising a plurality of individual antenna elements (108). The wavelength converting medium in the wavelength conversion layer in which the antenna array is arranged comprises photon emitters arranged in close proximity of the plasmonic antenna array such that at least a portion of photons emitted from the wavelength conversion layer are emitted by a coupled system comprising the photon emitter and the plasmonic antenna array. The plasmonic antenna array is configured to support plasmonic-photonic lattice resonances at a frequency range corresponding to the wavelength range of the photon emitter in the layer in which the plasmonic antenna array is arranged, such that light emitted from the plasmonic antenna array has an anisotropic angle distribution.
Owner:LUMILEDS

Metal-enhanced bioluminescence: an approach for monitoring biological bioluminescent processes

The present invention relates to surface plasmon-coupled bioluminescence, wherein bioluminescent emission from a bioluminescent chemical reaction couples to surface plasmons in metallized particles thereby enhancing the signal. Importantly, these plasmonic emissions emitted from metallic particles generated without an external excitation source but instead from induced electronically excited states caused by the bioluminescent chemical reaction.
Owner:UNIV OF MARYLAND BALTIMORE COUNTY

Flash memory structure and its preparation method

The invention relates to a quick flash memory unit, which is based on the vertical-channel fieldistor. It is characterized in that: the n+ doping area above the silicon base is the source; the n+ doping area at the two sides of silicon base are leak ends; the each side of silicon base has two multi-silicon grids, while the outer multi-silicon grid is the control grid and the inner multi-silicon grid is the float grid; the spaces between the float grid and the channel area and the source area are the tunnel oxygenation layers; the spaces between the control grid and the channel area and the float grid are the baffle oxygenation layers; the n+ leak ends at the two sides of silicon base are separated connected to form two memory units sharing the source end. The invention also provides a preparation method of said device, which is characterized in that: it uses the plasma coupling high-selection rate opposite etching technique and the reaction ion hermaphroditic etching technique, to self-position form the separation grid and float grid structures, while the channel length of control grid and the channel length of float grid are both realized by the etching technique.
Owner:PEKING UNIV +1

Optical emission collection and detection device and method

This invention generally relates to optical devices that can collect and detect signal emissions effectively while allowing the excitation light path and the sample flow path to coexist non-obstructively in a compact format. More specifically, this invention relates to a compact device having a multilayer coating on the structure surface and a wave guiding structure. In the device, using the surface plasmon coupling effect, the majority of the optical emission from the emitter on top of the multilayer coating is distributed toward the wave guiding structure. The wave guiding structure then further directs on signal to the detector with a high efficiency.
Owner:FLIR DETECTION

Plasma-enhanced substrate processing method and apparatus

A method and apparatus for processing a substrate in a capacitively-coupled plasma processing system having a plasma processing chamber and at least an upper electrode and a lower electrode. The substrate is disposed on the lower electrode during plasma processing. The method includes providing at least a first RF signal, which has a first RF frequency, to the lower electrode. The first RF signal couples with a plasma in the plasma processing chamber, thereby inducing an induced RF signal on the upper electrode. The method also includes providing a second RF signal to the upper electrode. The second RF signal also has the first RF frequency. A phase of the second RF signal is offset from a phase of the first RF signal by a value that is less than 10%. The method further includes processing the substrate while the second RF signal is provided to the upper electrode.
Owner:LAM RES CORP

Dual-mode surface plasmon coupled emission fluorescence imaging detection device and dual-mode surface plasmon coupled emission fluorescence imaging detection method

The invention discloses a dual-mode surface plasmon coupled emission (SPCE) fluorescence imaging detection device and a dual-mode surface plasmon coupled emission fluorescence imaging detection method, and relates to fluorescence imaging detection. The device comprises a sample system, an incident arm system and a detection arm system, wherein the sample system comprises double rotary tables, a sample holder, a prism and an optical quartz substrate; the double rotary tables comprise an upper rotary table, a lower rotary table and a central shaft; the incident arm system comprises a laser source, an attenuator, a polarizer, an microobjective, a pinhole, a planoconvex lens, a square iris diaphragm and a first optical guide rail; the detection arm system comprises a light filter, an imaging lens, a CCD (charge coupled device) receiver and a second optical guide rail. The size of the square iris diaphragm in the incident arm system is adjusted to obtain a rectangular incident light spot with a proper size; the detection of SPCE imaging in an RK (Kretschmann) mode is selected; the detection of SPCE imaging in a KR (Reverse Kretschmann) mode is selected. Therefore, the problem of difficulty for detection when a fluorescence signal is weak in the single RK mode can be effectively avoided.
Owner:XIAMEN UNIV

Method for removing sulfuryl fluoride by coupling plasma and chemical absorbing

The invention belongs to the technical field of gas pollutant treatment and provides a method for removing sulfuryl fluoride by coupling plasma and chemical absorbing, which is used for removing residual sulfuryl fluoride gas after fumigating. The treatment process of the method comprises: introducing a gas containing sulfuryl fluoride into a plasma reactor, wherein the sulfuryl fluoride decomposes into harmful gas products including sulfur oxide and fluoride under the action of the plasma; and introducing the gas product of the reaction into a gas liquid absorbing tower to absorb the gas by alkali liquor, and thus removing the sulfuryl fluoride waste gas in a harmless manner. The method has the advantage that after the sulfuryl fluoride is removed by coupling a plasma technique and chemical absorption, the treated gas reaches national discharge standards. Compared with discharging the sulfuryl fluoride into the atmosphere through ventilation at present, the method protects natural environment and human health. In addition, with simple process flow and low operation cost, the method is more suitable for on-site use.
Owner:ZHEJIANG UNIV OF TECH

Method and equipment for treating volatile organic compounds by low-temperature plasma coupling adsorption

The invention provides equipment and a method for treating volatile organic compounds by low-temperature plasma coupling adsorption, wherein a low-temperature plasma process and an adsorbing process are adopted, and volatile organic waste gas and odor gas are firstly treated by a low-temperature plasma device, and then enter an adsorbing device to be treated. When a low-temperature plasma coupling adsorption method is applied to treat organic waste gas and odor waste gas with non-methane hydrocarbon lower than 6000 ppm and sulfuretted hydrogen lower than 100 ppm, benzene in exhaust is lower than 4mg / m<3> and various odorous substances completely reach the standards in comparison with a mode of purely using an adsorbing method or purely using low-temperature plasmas; and the filling amount of an ozone disintegrant can be reduced by more than 50% and the regeneration period is prolonged by one time and more in comparison with a mode of independently using low-temperature plasmas.
Owner:CHINA PETROLEUM & CHEM CORP +1

Device for synthesizing nano particles through glow discharge and synthesis method thereof

The invention provides a method for synthesizing nano particles through glow discharge based on laser aiding and belongs to the field of plasma electrochemical synthesis of nano materials. Plasma produced by laser on the metal anode surface of a glow discharge device, plasma produced through laser induction and plasma produced through glow discharge are utilized to produce a synergistic effect and jointly act on a precursor solution, accordingly a glow discharge phenomenon is intensified, and the problems of small plasma volume, short discharge time, insufficient electrolyte electrolysis and large nano particle product size fluctuation of an existing glow discharge technology are solved. By adopting the method for synthesizing the nano particles through glow discharge based on laser aiding, high-energy-density plasma produced through high-power laser induction and the glow discharge plasma are effectively coupled, the nano particle preparation efficiency and nano particle size controlling capability is greatly improved, and the purposes of aiding glow discharge and rapidly and effectively synthesizing the nano particles are achieved. The method can be used for rapid nano particle pre-preparation and production.
Owner:SHANGHAI LANGYAN OPTOELECTRONICS TECH +1

Device for detecting medium refraction index change by utilizing spectrum intensity change

The invention discloses a device for detecting medium refraction index change by utilizing spectrum intensity change, which comprises a coupling prism, a metal layer, a sensing medium layer, a deformation Bragg reflector, a CCD sensor and a fluorescent substance layer, wherein the metal layer is evaporated on the surface of the coupling prism; the sensing medium layer is coated on the surface of the metal layer; and the fluorescent substance layer is coated on the surface of the CCD sensor. After a broad-spectrum sensing beam passes through the coupling prism, surface plasma mode resonance of specific wavelength and the metal layer on the surface of the prism occurs, the surface plasma resonance wavelength can be modulated through the surface medium refraction index of the metal layer, different medium refraction indexes correspond to the surface plasmas coupling in different wavelength, a sensing beam reflection spectrum passing through the prism is reflected onto the CCD sensor through the light splitting of the deformation Bragg reflector, and the absorption of surface plasma resonance light in specific wavelength is detected by utilizing the spectrum intensity change of the corresponding wavelength at different positions of the CCD sensor to achieve the purpose of detecting the surface medium refraction index change of the metal on the prism.
Owner:INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI

Homogeneous phase multi-component immunoassay method based on surface plasma coupling effect

ActiveCN102914646AEnable simultaneous quantitative analysisHigh sensitivityRaman scatteringReduction treatmentFluorescence
The invention discloses a homogeneous phase multi-component immunoassay method based on a surface plasma coupling effect. A gold nanosphere probe (Raman reactive dyes and capture antibodies are embellished on the surface of the gold nanosphere probe) and a gold nanorod probe (Raman reactive dyes and detection antibodies are embellished on the surface of the gold nanorod probe) are respectively prepared; the Raman reactive dyes carry sulfydryl self and are free of fluorescent background; and the antibodies are subjected to TCEP (Tris(2-carboxyethyl) phosphine) reduction treatment. The antigen of an object to be tested has immune sandwich reaction with the antibodies so as to generate an immune complex, so that the distances between nano particles are shortened, the surface plasma coupling effect is generated, the Raman signals of the surface embellishing dyes on the surfaces of the nano particles are significantly enhanced, and the SERS (Surface Enhanced Raman Scattering) quantitative analysis of the antigen is realized by using the coupling enhancing effect. The method is simple and rapid, the detection process needs only one step of operation without repeated elution or separating samples, the synchronous quantitative analysis to a plurality of components in the samples is realized with high sensitivity and good uniqueness, and thus the method is expected to become a new method in proteomics research and drug therapeutic effect evaluation.
Owner:HUNAN UNIV

Optical emission collection and detection device and method

This invention generally relates to optical devices that can collect and detect signal emissions effectively while allowing the excitation light path and the sample flow path to coexist non-obstructively in a compact format. More specifically, this invention relates to a compact device having a multilayer coating on the structure surface and a wave guiding structure. In the device, using the surface plasmon coupling effect, the majority of the optical emission from the emitter on top of the multilayer coating is distributed toward the wave guiding structure. The wave guiding structure then further directs the emission signal to the detector with a high efficiency.
Owner:FLIR DETECTION

Physical means and methods for inducing regenerative effects on living tissues and fluids

A system for the administration of modified plasma to a subject, including: (a) a non thermal plasma (NTP) emitting source for emitting a plasma beam; (b) a plasma coupling mechanism (PCM) with a plasma beam dish having at least one opening for the passage of the plasma beam; the plasma beam dish having a first surface and a second opposite surface. The first surface of the plasma beam dish includes: at least one coupling element selected from the group consisting of: (1) at least one ferroelectric element for providing the field; (2) at least one ferromagnetic element for providing the field; (3) at least one piezoelectric element for providing the field; and (4) at least one piezomagnetic element for providing the field. The system additionally includes at least one reflecting element configured to focus the NTP beam, thereby providing the modified plasma.
Owner:ORTERON T O

Photon-to-plasmon coupler

An embodiment of the present invention relates to a photon-to-plasmon coupler for converting photons to plasmons or vice versa, said photon-to-plasmon coupler comprisinga photonic waveguide for guiding photons,a plasmonic waveguide for guiding plasmons, andtwo plasmonic strip waveguides,each of said two plasmonic strip waveguides being connected to said plasmonic waveguide and embracing an end section of the photonic waveguide such that each of said plasmonic strip waveguides is optically coupled to the end section of the photonic waveguide.
Owner:HUMBOLDT UNIV BERLIN

Conjugate antenna structure oriented towards plasma coupling impedance rapid changes

The invention discloses a conjugate antenna structure oriented towards plasma coupling impedance rapid changes. The conjugate antenna structure comprises a box, wherein a Faraday shield is fixed to the box, an antenna current strap is installed between the box and the Faraday shield, the antenna current strap comprises two polar current straps and two annular current straps, the feed-in ends of the two polar current straps are respectively connected with a matching capacitor, the other ends of the two polar current straps are grounded, adjustable vacuum capacitors serve as the matching capacitors, the two matching capacitors are connected through a T-shaped plate and a vacuum transmission line, and an impedance imaginary part on the central point of the T-shaped plate is zero; radio frequency power is fed into the two polar current straps through the same vacuum transmission line and through the matching capacitors respectively, so that a conjugate structure is formed; protection limiters are arranged on the two sides of the box respectively. According to the conjugate antenna structure oriented towards the plasma coupling impedance rapid changes, the whole system can be in a perfect matching state.
Owner:HEFEI CAS ION MEDICAL & TECHNICAL DEVICES CO LTD

Ultra-sensitive SERS substrate and preparation method thereof

InactiveCN104777151AIncreased sensitivityAdjustable coverage densityRaman scatteringPlasmonic couplingGraphene
The invention relates to an ultra-sensitive SERS substrate and a preparation method thereof. A superstrong plasma coupling effect is produced while the Cu nanometer particles are separated from a Cu film by use of graphene, so that the sensitivity of the SERS based on copper can be obviously promoted. By use of full copper material, the cost of the structure is greatly lowered. The Cu nanometer particles are directly paved on the Cu film growth with graphene on the surface by virtue of a chemical vapor deposition (CVD) method in the preparation process, and the complex graphene transferring process is omitted. Furthermore, the coverage density of the Cu nanometer particles of the structure is adjustable, and sandwich structure substrates with different Cu nanometer particles coverage densities can be obtained after the Cu film is soaked in the acetone for a certain time. The preparation method is convenient and fast.
Owner:NORTHWESTERN POLYTECHNICAL UNIV

Multifunctional surface plasma coupled emission fluorescence and Raman detector and detection method thereof

ActiveCN108645831AAvoid the influence caused by local unevenness, etc.Raman scatteringFluorescence/phosphorescenceMicroscopic imageImage detection
The invention discloses a multifunctional surface plasma coupled emission fluorescence and Raman detector and a detection method thereof, relating to detection of fluorescent spectrum, Raman spectrum,fluorescent imaging and fluorescent microscopic imaging. The detector comprises an angle distinguishing module, an excited light path module, a fluorescent spectrum detection module, a Raman spectrumdetection module, an imaging detection module and a microscopic imaging detection module, wherein the modules are separately fixed on corresponding rotary tables through optical guide rails, and canrotate simultaneously or independently around a prism and a membrane sample on the prism, excitation signals of different angles and emission signals of different angles can be generated by rotating the modules, and a square pyramid mirror is used as a coupling element and combines with the detection modules so as to enable the detector to acquire surface enhanced fluorescence and Raman, spectrumand imaging information and so on of the same sample simultaneously without using a light splitting system. The detector has a simple structure, is low-cost, is easy to operate, and is easy to promote.
Owner:XIAMEN UNIV

Quantum dot and plasma coupled color filter preparation method

The invention provides a preparation method of a metal quantum dot plasma coupler color filter. The preparation method comprises the steps that 1) metal nanoparticles (1) are prepared by utilizing a polyol method; 2) metal / SiO2 core / shell composite particles (3) coated by silicon dioxide shell layers (2) of different thicknesses are prepared; 3) amination of the surface of the metal / SiO2 core / shell composite particles is performed by utilizing 3-aminopropyltriethoxysilane; 4) oil phase red light quantum dots and green light quantum dots (4) are prepared by utilizing a high temperature thermal decomposition method and surface ligands are replaced by 3-mercaptopropionic acid; 5) the metal / SiO2 core / shell composite particles are connected with the quantum dots by utilizing a self-assembling method so that a metal quantum dot plasma coupler (5) is formed; 6) ethyl orthosilicate is catalyzed to be hydrolyzed by utilizing ammonia to prepare SiO2 sol; 7) the metal quantum dot plasma coupler is mixed with the SiO2 sol so that metal quantum dot plasma coupler dispersion liquid is formed; and 8) metal quantum dot plasma coupler dispersion liquid is enabled to form a pixel image by utilizing a spraying method.
Owner:SOUTHEAST UNIV

Apparatus for measuring entrance phase position of Tokamak low-noise-wave antenna array and phase-appraising method

InactiveCN1936606AAvoid losing lockAvoid the disadvantage of not being able to measure phasePulse automatic controlRadiation/particle handlingLow noiseKlystron
The invention discloses a phase-measuring device and identification method to entrance Tokamak low clutter antenna phase. That is to connect a dual directional coupler respectively at the root of every klystron output waveguide transmission line and near the antenna. Each dual directional coupler microwave signal is separated into two parts through filter and two straight power splitters respectively access Module A, B input. Phase two modules used to work, A module will phase output phase voltage curves of the same phase of the two phase corresponding phase combined output phase voltage module B identify a phase value. The invention measures and phases out amount of regulation quickly and accurately when Tokamak system sends the 2.45 GHz microwave signal to antenna phase entrance, provides accurate feedback phase of the phase control, provide a reliable technical support for studying microwave plasma coupling efficiency.
Owner:INST OF PLASMA PHYSICS CHINESE ACAD OF SCI

Two-dimensional flexible precious metal nanoparticle superlattice film and construction method and application thereof

InactiveCN110899720AEnhance the surface electromagnetic field coupling strengthWide range of resonance absorption peaksMaterial nanotechnologyTransportation and packagingMacroscopic scaleNanoparti cles
The invention discloses a two-dimensional flexible precious metal nanoparticle superlattice film and a construction method and application thereof. The superlattice film is constructed by self-assembling gold-core silver-shell nano-bricks with a high length-diameter ratio on a gas-liquid interface after surface ligand modification. According to the invention, the gold-silver bimetal nano brick with a high length-diameter ratio is used as a basic construction unit; a polymer-based ligand modification method is provided to regulate and control the complex acting force among anisotropic nanoparticles, and a substrate-free self-supporting two-dimensional superlattice film with macroscopic large scale and ordered microcosmic height is constructed through a gas-liquid interface self-assembly method; and the plasma coupling and electromagnetic field enhanced hot spot distribution are regulated and controlled through the nanoparticle morphology, shell layer size, particle spacing and the like,so that a flexible thin film material with controllable optical performance and Raman enhancement effect is constructed. The two-dimensional flexible superlattice film can be used as a surface enhanced Raman detection substrate, has an excellent Raman enhancement effect, and can be used for rapid detection of cancer markers and toxic chemical substances.
Owner:SOUTHEAST UNIV

Plasma coupled photo-catalysis method and system for removing ethylene in fresh-keeping storehouse of vegetables and fruits

The invention discloses plasma coupled photo-catalysis method and system for removing ethylene in a fresh-keeping storehouse of vegetables and fruits. The method comprises the steps of firstly, generating plasmas by corona discharge to primarily oxidize and degrade ethylene in the fresh-keeping storehouse of vegetables and fruits, and then further oxidizing and degrading the ethylene in the fresh-keeping storehouse of vegetables and fruits by a photocatalyst. The system comprises the fresh-keeping storehouse of vegetables and fruits, a corona discharge plasma coupled photo-catalysis device and a power fan, which are sequentially connected through a gas pipeline in cycle; and a corona discharge plasma reaction unit and a photo-catalysis reaction unit are respectively arranged inside the corona discharge plasma coupled photo-catalysis device. The ethylene in the fresh-keeping storehouse of vegetables and fruits is removed by a method of combining corona discharge plasma coupling and photo-catalysis; the ethylene-containing gas in the fresh-keeping storehouse of vegetables and fruits can be efficiently processed; the concentration of O3 contained in the gas in the fresh-keeping storehouse of vegetables and fruits is effectively reduced; and the ethylene degradation efficiency and the fresh-keeping quality of the vegetables and fruits are greatly improved in comparison with the traditional method.
Owner:SOUTH CHINA AGRI UNIV
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