The application discloses an in-situ
infrared double observation device and method of a variable
plasma coupling structure, which comprises four parts of a
plasma power supply unit, a
gas supply and separation and purification unit, an in-situ reaction /
observation unit and a
signal acquisition
control unit. The in-situ reaction / observation cavity realizes
initiation of multiple
discharge modes and in-situ observation by regulating
electrode structure and power supply parameters, and simultaneously obtains evolution processes of steady-state products, transient gas-phase species and surface adsorption species. The high-
voltage electrode at the top of the cavity is directly connected with a parameterized
pulse power supply after being isolated by an insulating medium, and reaction raw gas is mixed into the cavity after being controlled by a flow controller, so that the
discharge process is controllable and stable. The application has high function integration degree, can be widely used in
surface processing and catalytic reaction processes dominated by
plasma technology, is easy to reveal a high-selectivity production
route of target products and realizes real-time optimization of a process through
process control feedback, and has a good prospect in
basic research and industrial application.