The invention relates to the technical field of
solid waste recycling and nano material preparation, in particular to a method for preparing a
silicon-carbon nano material by treating
silicon sludge through
plasma thermal spraying, which comprises the following steps: S1, mechanically mixing
silicon sludge waste, a
liquid carbon precursor and
graphene oxide according to a
mass ratio of 1: (0.001-1): (0.001-1); s2, carrying out
spray drying on the mixed material at the temperature of below 180 DEG C to obtain spherical precursor
powder with the particle size of 5-50 microns; s3, Ar / H2
mixed gas is used as carrier gas, the volume ratio of H2 is 5-20%, and a
microwave plasma torch is adopted to heat the precursor
powder to 1500-2000 DEG C within 10 seconds; s4, calcining at 600-800 DEG C for 3-10 hours in an Ar / H2 protective
atmosphere, so that the carbon precursor is cracked to form a continuous
coating layer; according to the preparation method, limitation of a traditional step-by-step process is broken through, cooperative regulation and control of unbalanced
etching of the silicon-
oxygen layer, gradient growth of the
carbon layer and self-
assembly of the conductive network are achieved, the obtained material has high specific capacity (larger than 2200 mAh / g) and excellent cycle stability, and an efficient and green solution is provided for
resource utilization of photovoltaic silicon
sludge.