Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device

A sensitive, radiation-sensitive technology used in the field of radiation-sensitive compositions to solve problems such as pattern edge defects or side etching

Inactive Publication Date: 2008-01-16
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, for conventional colored radiation-sensitive compositions, defects or side etching at the edge of the pattern are prone to occur during development, so it is difficult to obtain pixels and black matrices with good pattern shapes while shortening the production cycle time, and form high-definition patterns. It can be said that there are still deficiencies

Method used

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  • Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device
  • Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device
  • Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device

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Embodiment

[0291] Examples are given below to further illustrate the present invention in detail. The present invention is not limited by the following examples. Here, parts are based on weight.

[0292]

Synthetic example 1

[0293] Synthesis Example 1 (Synthesis of diglycidyl etherate of diphenol)

[0294] Add 1,070 g of a mixture of diphenol (9): diphenol (10) = 70:30 (weight ratio) (trade name YP-90, manufactured by Mass Harak Mikar Co., Ltd.), 1520 g into a flask equipped with a condenser and a stirrer Epichlorohydrin and 1,700 g of dimethyl sulfoxide were heated to 50°C while stirring to dissolve, then 290 g of caustic soda was added and reacted at 65-90°C for 10 hours. The epoxy equivalent is measured to confirm the progress and end point of the reaction. When the epoxy equivalent reaches the target value, the solvent is distilled off under reduced pressure at 90-100°C. Then the reaction product was re-dissolved in toluene at 50-70°C, washed with distilled water and separated by standing, and then the organic layer was desolventized under reduced pressure to obtain 1260 g of reaction product. The epoxy equivalent of the obtained reaction product was 260.

[0295] Determination of the reaction pro...

Synthetic example 2

[0298] Synthesis example 2 (Synthesis of dimethylacryloyl-containing diol compound)

[0299] Into a flask equipped with a condenser and a stirrer, 1000 g of the diglycidyl ether compound obtained in Synthesis Example 1, 350 g of methacrylic acid, and 1.0 g of hydroquinone monomethyl ether were added, and heated to 60°C while stirring to dissolve it. Then add 8g of tetraethylammonium bromide and continue the reaction while stirring at 70-90°C until the acid value of the reaction product is 8mgKOH / g and the epoxy equivalent is 17,000. After 15 hours, the end point is confirmed by the acid value and epoxy equivalent. , And then cooled to room temperature to obtain 1,300 g of reaction product. The acid value of the obtained reaction product was 8 mgKOH / g, the hydroxyl value was 165 mgKOH / g, and the epoxy equivalent was 17,000.

[0300] For the reaction product, determine 1 H-NMR spectrum, visible chemical shift δ (ppm) at 5.6 and 6.1 (from the double bond of methacrylic acid; 4H), 3.9...

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Abstract

The present invention relates to a radiation sensitive composition formed on the dyed layer which contains the following components: (A) a colorant, (B) an alkaline soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization evocating agent, wherein the (B) alkaline soluble resin is the polyester which is provided with a alicyclic ring hydrocarbon skeleton at the backbone chain and a polymerized unsaturated bond at the side chain. The invention provides the radiation sensitive composition for forming the dyed layer which will not generate residue of the non-solute material or the scum of the pattern margin when it is developed, and will not generate the defect of the patter margin or the side-corroded dyed layer when the amount of the exposure is low.

Description

Technical field [0001] The present invention relates to a radiation-sensitive composition, a color filter, and a color liquid crystal display element for forming a colored layer. In more detail, it relates to a radiation-sensitive composition used in the formation of a colored layer for preparing color filters used in transmissive or reflective color liquid crystal display devices, color imaging tube elements, etc.; A color filter having a colored layer formed of the radiation-sensitive composition; and a color liquid crystal display element having the color filter. Background technique [0002] Conventionally, when manufacturing a color filter using a colored radiation-sensitive composition, it is known that the colored radiation-sensitive composition is coated on a substrate or a substrate on which a light-shielding layer of a desired pattern is formed in advance, dried, and then applied to the dried The film is irradiated with radiation in a desired pattern shape (hereinafter ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/028
CPCC09B11/24C09B19/02G02B5/201G03F7/0007G03F7/0035G03F7/004G03F7/027G03F7/033G03F7/0382
Inventor 白土香织平井刚饭岛孝浩
Owner JSR CORPORATIOON
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