Exposure apparatus and exposure method

A technology of equipment and light, applied in the field of spatial light modulation, can solve the problems of low image quality, deterioration of exposure performance of exposure equipment, low exposure speed, etc., and achieve high-precision holding/moving mechanism, stable holding/moving mechanism, high-precision focus The effect of position adjustment

Inactive Publication Date: 2008-03-12
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This causes problems such as low exposure speed, low image quality, or the like, and deteriorates the exposure performance of the exposure equipment

Method used

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  • Exposure apparatus and exposure method
  • Exposure apparatus and exposure method
  • Exposure apparatus and exposure method

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Embodiment Construction

[0057] Next, an exposure apparatus and an exposure method according to the present invention will be described with reference to the drawings.

[0058] 1. Structure of Exposure Equipment

[0059] 1-1 External view of exposure equipment

[0060] First, an external view of the exposure apparatus will be described. FIG. 1 is a schematic external view of an exposure apparatus 10 . The exposure apparatus 10 includes a moving table 14 which is a flat plate. The mobile table 14 holds the 12 sheets of photosensitive material by adsorbing the 12 sheets of photosensitive material on its surface. Furthermore, two guide rails 20 extending along the moving direction of the table are provided on the upper surface of the base 18 . The base 18 is a thick plate. The base 18 is supported by four leg members 16 . The table 14 is arranged in such a manner that the longitudinal direction of the table 14 is the moving direction of the table 14 . In addition, the table 14 is supported by rail...

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Abstract

An exposure apparatus (10) includes a light source unit (60) for emitting exposure light, a DMD (90) for performing spatial light modulation, based on an image signal, on the exposure light, an imaging optical system (50) for forming an image on a photosensitive material (12) with the exposure light on which spatial light modulation has been performed, and a pair (54) of wedge prisms for adjusting focus by changing the optical path length of the modulated exposure light when an image is formed on the photosensitive material (12) with the modulated exposure light. In the imaging optical system (50), distortion at a peripheral portion of a projection lens is increased, and optical performance of the lens at a region including a central portion is improved. An image is formed only by a substantially rectangular region of the projection lens, including the central portion, with the modulated exposure light.

Description

technical field [0001] The present invention relates to an exposure apparatus for exposing a photosensitive material to light by projecting light, wherein spatial light modulation is realized by an imaging optical system. The invention also relates to its exposure method. Background technique [0002] Exposure apparatus comprising spatial light modulators are known in the prior art. The spatial light modulator performs spatial light modulation on the incident light based on the image signal, and forms an image. In this exposure apparatus, a two-dimensional pattern formed by a spatial light modulator is projected onto a photosensitive material to expose the photosensitive material. As a spatial light modulator, a digital micromirror device (hereinafter referred to as "DMD") is known (please refer to Unexamined Japanese Patent Application No. 2001-305663). In the DMD, multiple micromirrors are arranged in two dimensions (for example, 1024 pixels×756 pixels), and the inclina...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20H01L21/027
CPCG03F7/70791G03F7/70275G03F7/70291G02B26/0833
Inventor 冈崎洋二石川弘美
Owner FUJIFILM CORP
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