Multi-layer laminate and flexible copper-clad laminated substrate production method
A manufacturing method and technology for a copper clad layer, which are applied in the manufacture of printed circuit precursors, printed circuit manufacturing, circuit substrate materials, etc., can solve the problems of bonding strength between ultra-thin copper foil and resin layer, etc.
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[0052] Hereinafter, the present invention will be specifically described based on examples and comparative examples, but of course the present invention is not limited thereto.
Synthetic example 1
[0054] 29.13 g (0.071 mol) of BAPP were dissolved in 294 g of DMAc. Next, 3.225 g (0.011 mol) of BPDA and 13.55 g (0.062 mol) of PMDA were added. Then, the stirring was continued for about 3 hours to carry out a polymerization reaction to obtain a polyimide precursor resin solution a of 35 poise (25° C.). In addition, the obtained polyimide precursor resin solution a was coated on a copper foil, dried at 130° C. for 5 minutes, and then heated to 360° C. over 15 minutes to complete imidization and produce polyimide In the case of an amine film, the coefficient of thermal expansion of the obtained film was measured, and the result was 55×10 -6 / K.
Synthetic example 2
[0056] 203.22 g (0.957 mol) DADMB and 31.10 g (0.106 mol) 1,3-BAB were dissolved in 3.076 kg of DMAc. Next, 61.96 g (0.211 mol) of BPDA and 183.73 g (0.842 mol) of PMDA were added. Then, the stirring was continued for about 4 hours to carry out a polymerization reaction to obtain a polyimide precursor resin solution b at 250 poise (25° C.). Furthermore, the coefficient of thermal expansion when producing a polyimide film in the same manner as in Synthesis Example 1 using the obtained polyimide precursor resin solution b was 15×10 -6 / K.
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