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Method for preparing surface porous metal material

A metal material with a porous surface technology, applied in metal processing equipment, welding equipment, manufacturing tools, etc., can solve problems such as process instability, micropore size, density and distribution are difficult to control

Inactive Publication Date: 2008-04-30
JIANGSU UNIV
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Problems solved by technology

[0007] The purpose of the present invention is to solve the instability of the traditional process for preparing porous metal materials, especially the problem that the micropore size, density and distribution are not easy to control

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  • Method for preparing surface porous metal material
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Embodiment Construction

[0019] Polycrystalline pure copper material with nano-grains (average grain size 26nm) was used as the target material (see Figure 1), and Nadezhda-2 low-energy, high-current, short-pulse electron beam device was used for irradiation, and high-current pulse The working parameters of the electron beam irradiation are: the electron beam energy is adjusted between 18-28KeV, the pulse time is 3.5μs, and the vacuum chamber pressure is about 10 -5 Torr, the pulsed electron beam energy density was controlled at 2 J / cm by adjusting the distance between the workpiece and the cathode, respectively 2 , 3 J / cm 2 and 4 J / cm 2 The samples were irradiated. Through experimental research, the conditions for forming surface microporous pure copper are obtained as follows:

[0020] The energy density of the pulsed electron beam is 2 J / cm 2 When irradiated 10 times, pores with a size of about 50nm and fairly uniform distribution can be obtained. The pores are separated from each other, and t...

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Abstract

The invention discloses a method for preparing multi-aperture metal materials, and the invention is disclosed for solving the problem of instability of the present preparation technology of the multi-aperture metal materials and the problem of the difficult controlling of size and density of pores. The producing characteristics of the method are that high-current pulse electronic beam (HCPEB) is employed to irradiate the metal materials, the working parameters of the high-current pulse electronic beam are that the energy of the electronic beam is 18-28 kilo electron volt, the pulse time is 3.5 microseconds, the energy density is about 2-4Jcm-2, and the air pressure of a vacuum chamber is about 10-5Torr. According to the requirements of pore size, distribution density and the like, technology parameters of grain size of materials needed to be irradiated, the energy of pulse electronic beam and the irradiating times are properly selected, and thereby different index requirements are met. The preparation technology disclosed by the invention is stable, and is capable of obtaining the metal materials of multi-pores on the surface, and the quantity and the distribution of the pores are controllable.

Description

technical field [0001] The invention relates to the technical field of porous material preparation, in particular to a method for preparing surface porous metal materials by using low-energy, high-current, and short-pulse electron beams as impact sources. Background technique [0002] Porous materials are new materials developed in recent years, which have the characteristics of structural materials and functional materials. Compared with dense materials, the remarkable feature of porous materials is that they have a large number of pores inside, which determines many excellent characteristics of porous materials, such as small specific gravity, high specific strength, good energy absorption, large specific surface area, and vibration suppression effect. Good, good permeability and sound absorption, good electromagnetic wave absorption characteristics and sensitivity to gas and other characteristics. These characteristics make porous materials widely used in filters, cataly...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B23K15/08
Inventor 关庆丰程笃庆
Owner JIANGSU UNIV
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