6nm-100nm wave band extreme ultraviolet imaging optical instrument imaging quality test device

A 6nm-100nm, extreme ultraviolet imaging technology, which is applied in the field of imaging quality testing devices for extreme ultraviolet imaging optical instruments, can solve the problems that the detection of imaging quality resolution cannot be realized, and the imaging quality detection of extreme ultraviolet imaging systems cannot be realized. Simple, reliable effects

Inactive Publication Date: 2008-04-30
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The detection of the imaging quality, especially the resolution, of the extreme ultraviolet imaging optical system cannot be realized by the usual methods mentioned above.
This is because: extreme ultraviolet light cannot propagate in any medium ot

Method used

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  • 6nm-100nm wave band extreme ultraviolet imaging optical instrument imaging quality test device
  • 6nm-100nm wave band extreme ultraviolet imaging optical instrument imaging quality test device
  • 6nm-100nm wave band extreme ultraviolet imaging optical instrument imaging quality test device

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Experimental program
Comparison scheme
Effect test

Example Embodiment

Specific embodiment 1:

[0012] The entire optical system is under vacuum. The extreme ultraviolet light source 1 emits extreme ultraviolet light beams after passing through the precision-drawn metal grid 7, hitting the mirrors 3 and 4, and finally passing through the extreme ultraviolet imaging optical system 5 to be tested in the extreme ultraviolet camera 6. In the upper imaging, the grid size of the metal grid is compared with the formed image, and the resolution data of the optical system under test can be obtained through calculation.

[0013] The extreme ultraviolet light source can choose the hollow cathode light source, and the grid can be obtained by micro-machining method, and the grid grid precision is 19μm. Made of metallic nickel.

Example Embodiment

Specific implementation 2:

[0014] The entire optical system is under vacuum. The extreme ultraviolet light source 1 emits extreme ultraviolet light beams after passing through the precision-drawn metal grid 7, hitting the mirrors 3 and 4, and finally passing through the extreme ultraviolet imaging optical system 5 to be tested in the extreme ultraviolet camera 6. In the upper imaging, the grid size of the metal grid is compared with the formed image, and the resolution data of the optical system under test can be obtained through calculation.

[0015] The extreme ultraviolet light source selects the laser plasma light source, the grid can be obtained through the synchrotron radiation LIGA process, and the grid grid accuracy is 13μm. Made of metallic nickel.

Example Embodiment

Specific implementation mode 3:

[0016] The entire optical system is under vacuum. The extreme ultraviolet light source 1 emits extreme ultraviolet light beams after passing through the precision-drawn metal grid 7, hitting the mirrors 3 and 4, and finally passing through the extreme ultraviolet imaging optical system 5 to be tested in the extreme ultraviolet camera 6. In the upper imaging, the grid size of the metal grid is compared with the formed image, and the resolution data of the optical system under test can be obtained through calculation.

[0017] The extreme ultraviolet light source selects the laser plasma light source, the grid is obtained through the synchrotron radiation LIGA process, and the grid grid accuracy is 2μm. Made of metallic nickel.

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Abstract

The invention belongs to the image optical filed of a shortwave segment, in particular to an image quality measuring device for an EUV image optical instrument. The invention includes a measuring device designed referring to the following drawing. The whole optical system is positioned under a vacuum condition. The EUV beam from an EUV light source 1 is bit onto reflectors 3 and 4 after passing through a metal mesh 7 which is carved accurately, and then is imaged on an EUV camera 6 after passing through a measured EUV image optical system 5. The grid size of the metal mesh is compared with the finished image, and the resolution data of the measured optical system is obtained through computation. The invention has the beneficial effects of providing an image quality measuring device for EUV image optical instrument with simple structure and reliable performance.

Description

technical field [0001] The invention belongs to the field of short-wavelength imaging optics, in particular to an imaging quality testing device for extreme ultraviolet imaging optical instruments. Background technique [0002] The imaging quality evaluation of the imaging optical instrument system is an essential link in the development of optical instruments, and it is also one of the important indicators for the functional verification of instrument applications. The evaluation methods of optical system imaging quality mainly include star point method, knife edge method, shadow method, resolution measurement, modulation transfer function measurement and so on. Among them, resolution measurement is the simplest and most direct method. In general, most visible or infrared optical instrument systems use detection methods and devices for resolution measurement such as reference figure 1 , expressed as follows: the parallel light generated by the light source 1 passes throug...

Claims

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Application Information

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IPC IPC(8): G01M11/00G01M11/02
Inventor 巩岩
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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