Electronic gun power supply for reflected high energy electron diffraction instrument

A high-energy electron diffraction and electron gun technology, applied in the field of electron diffraction, can solve problems such as poor working reliability, and achieve the effect of high reliability and small size

Active Publication Date: 2008-05-14
SHENYANG SCI INSTR RES CENT CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to overcome the disadvantages of poor reliability in the prior art, the purpose of the present invention is to pr...

Method used

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  • Electronic gun power supply for reflected high energy electron diffraction instrument
  • Electronic gun power supply for reflected high energy electron diffraction instrument
  • Electronic gun power supply for reflected high energy electron diffraction instrument

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Embodiment Construction

[0036] like figure 1 As shown, the electron gun is mainly composed of a filament 1, a grid 2, an anode 3, a deflector 4, a fluorescent device 6, and a camera 7. In an ultra-high vacuum, a high voltage (from a high-voltage power supply 9) is applied to the filament 1 and the grid 2 , increase the working current of the filament (from the filament power supply 11), so that the filament 1 emits electrons. Under the action of the anode 3, the electrons are accelerated and move toward the anode 3. Through the anode hole to reach the fluorescent screen. The electrons emitted by the tip of the filament 1 converge outside the anode 3 to form a cross spot, and an appropriate grid voltage (from the grid power supply 10) is applied to the grid to increase the focal length of the electron gun, and the electron beam cross spot at the anode hole Move to the fluorescent screen, forming a telephoto gun. When the deflection voltage (from the deflection power supply 8) is applied to the defl...

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Abstract

The invention discloses a power supply of an electron gun for a reflection high-energy electron diffractometer, wherein, the high-voltage power supply which consists of a high-voltage part and a low-voltage adjusting part is minus 25 KV,, the output of a resonance circuit of the high-voltage part is connected on a lamp wire of the electron gun and a grid by generating the high voltage of minus 25KV by a 10-time rectifier filter; the low-voltage adjusting part is connected with the high-voltage part and a second driving tube by an adjusting tube, an input signal which is connected with the second driving tube comes from the high-voltage part and an overflow protection and fault alarm circuit of a current sampling amplifying circuit, a slow starting circuit is connected with the overflow protection and fault alarm circuit and a voltage sampling amplifying circuit; the input of a high-voltage measurement display circuit is the high-voltage part, the output thereof is connected with a display; a deflection power supply includes a low-voltage signal circuit and a high-voltage amplifying circuit, the low-voltage signal circuit provides the voltage signals with two reverse polarities andis connected with the high-voltage amplifying circuit and is finally connected with a deflection plate. The invention has reliable work and simple structure.

Description

technical field [0001] The invention relates to electron diffraction technology, in particular to a -25KV electron gun power supply for a reflective high-energy electron diffractometer. Background technique [0002] The -25KV electron gun power supply is used in conjunction with the long focal length electron gun, which is collectively called the reflection high energy electron diffractometer (RHEED). The diffractometer is an indispensable monitoring instrument for molecular beam epitaxy growth equipment. It is mainly used to study the disorder of sample surface reconstruction, roughness, steps and facets during MBE growth. At the same time, with the RHEED intensity oscillation detection system, it can also be used as a beam current standard in daily growth, control of alloy composition, measurement of quantum well and superlattice thickness, control of growth temperature, etc. [0003] In the power supply produced before, the filament current cannot be directly displayed,...

Claims

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Application Information

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IPC IPC(8): G01N23/20G01N23/205H02M7/10H02M7/538G05F1/56H03F3/45H03F1/52
CPCY02B70/1441Y02B70/10
Inventor 薛玉茹
Owner SHENYANG SCI INSTR RES CENT CHINESE ACAD OF SCI
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