Fluid control apparatus

Abstract

A fluid control apparatus is provided with a fluid control valve for controlling the pressure of a fluid by pressure operation of a fluid for control; a flow volume measuring apparatus for measuring the flow volume of the fluid, converting the measured value of the flow volume into electric signals and outputting the signals; and a control section for outputting a command signal for controlling an opening area of the fluid control valve to the fluid control valve or to an apparatus which operates the fluid control valve, based on a deviation of the electric signal from a set flow volume outputted from the flow volume measuring apparatus.

Description

Technical field [0001] The present invention relates to a fluid control device used in a fluid delivery piping that requires fluid control. In more detail, it involves easy installation, piping, and wiring connections mainly in semiconductor manufacturing equipment. Even if pulsating fluid flows through, the flow rate can be controlled without any problems, and the flow rate can be finely performed in a large flow rate range. Controlled fluid control device. Background technique [0002] Conventionally, as one step of the semiconductor manufacturing process, wet etching in which the surface of the wafer is etched using washing water obtained by diluting a chemical liquid such as hydrofluoric acid with pure water. It is necessary to control the concentration of the washing water of these wet etching with high accuracy. In recent years, a method of managing the concentration of washing water based on the flow ratio of pure water and chemical liquid has become mainstream. Therefore,...

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Problems solved by technology

[0005] However, the above-mentioned existing pure water flow control device 301 balances the output pressure of the pure water in the flow regulating valve 302, thereby controlling the pure water flow output from the flow regulating valve 302 to be constant. Therefore, it is not suitable for The flow rate is finely controlled, and the flow range is not wide enough, so there is a problem that it is difficult to control the flow rate in a wide flow range

In addition, since there are many components, when installing them in semiconductor manufacturing equipment, etc., it is necessary to perform piping connection work, electric wiring, and air piping work for each component separately, and the work is complicated and time-consuming, and the piping and wiring may be complicated. error occurred

[0006] In addition, in the above-mentioned conventional flow control assembly 306, when the fluid flowing into the fluid control device is a pulsating fluid with a short pressure fluctuation period, there is a problem that although the control valve 308 intends to perform flow control on the pulsating fluid, However, it will cause oscillation and fluid control cannot be performed. If it continues, there will be a problem that the driver 311 and the control valve 308 may be damaged.

In addition, since the flow range for flow control is not wide, there is a problem that it is difficult to use for flow control in a large flow range.

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