Coated substrates and methods for their preparation
A substrate and coating technology, applied in coatings, semiconductor/solid-state device manufacturing, transportation and packaging, etc., can solve problems such as reducing the effectiveness of coatings
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
Embodiment 2
[0114] In a flask combine concentrated hydrochloric acid (37%, 600 g), 1020 g of toluene, and 3.0 g of sodium octanesulfonate monohydrate. A solution consisting of 90.75 g (0.67 mol) of trichlorosilane, 100.15 g (0.67 mol) of methyltrichlorosilane and 6.14 g (0.038 mol) of trichlorovinylsilane was added dropwise to the in the mixture. The mixture was stirred at room temperature for 4 hours, after which time the aqueous layer was removed. The resulting organic layer was washed with 100 ml of 45% sulfonic acid (2 times) and with 250 ml of deionized water (10 times). The solution was dried over magnesium sulfate and passed through a sintered glass filter. Toluene was removed under reduced pressure at 30 °C using a rotary evaporator. The residue was placed under vacuum (1 Pa) at room temperature overnight to give a silicone resin having the following formula (as determined by 29SiNMR and 13CNMR) and a weight average molecular weight of 11,600:
Embodiment 3
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com