Spherical parts batch plasma based ion injection method and apparatus thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- HARBIN INST OF TECH
- Publication Date
- 2009-01-28
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
Technical field
[0001] The invention relates to a plasma-based ion implantation method and device for spherical parts, and belongs to the technical field of plasma-based ion implantation. Background technique
[0002] Plasma-based ion implantation technology can achieve low-temperature surface modification of precision parts. Its characteristic is that it does not change the dimensional accuracy of the processed parts, and the temperature can be controlled at room temperature or slightly higher than room temperature, and can be used for all parts in a plasma environment. The surface is implanted at the same time, so this technology can realize batch processing. The basic principle of this technology is to form a plasma space around the workpiece. When a negative high voltage pulse is applied to the workpiece, the plasma is affected by the electric field on the workpiece to form a positive ion sheath around the workpiece. The electric field force is injected into the surface of th...