Arc source of rotary magnetron arc ion plating

Abstract

The invention relates to the field of film preparation, in particular to a rotary magnetron arc ion plating arc source which controls the arc point movement by making use of a rotary magnetic field. A rotary magnetic field generating device is arranged in the space around a target material, the rotary magnetic field generating device forms a whole electromagnetic circuit framework by adopting a plurality of magnetic poles which are different from angles differing in a certain angle, connected with each other and are evenly distributed on the same circumference, the amount of the magnetic poles is 4n or 3n, wherein, the n is not less than 1; an excitation coil is sheathed on the magnetic poles or is embedded in a slot between the adjacent magnetic poles, two-phase excitation with the phase difference of 90 degrees or three-phase excitation with the phase difference of 120 degrees is adopted to supply power so as to generate an adjustable rotary magnetic field in a space surrounded by the magnetic poles. By controlling the arc point movement through the rotary magnetic field with adjustable speed and amplitude, the arc source can improve the discharge form and the operating stability of the arc spot, improve the etching uniformity and the utilization rate of the target material and reduce the large particle emission of the target material. The arc source is used for preparing high-quality films and functional films and expanding the application range of the arc ion plating.

Description

technical field The invention relates to the field of thin film preparation, in particular to a rotating magnetron arc ion plating arc source which utilizes a rotating magnetic field to control the movement of the arc spot, which is used to improve the discharge form of the arc spot, control the movement of the arc spot, and improve target etching. Uniformity, reducing or suppressing the emission of large particles of the target to prepare high-quality thin films. Background technique Arc ion plating is one of the most important technologies in industrial coating production and scientific research. Due to its simple structure, high ionization rate (70%-80%), high energy of incident particles, good diffraction, it can realize low temperature deposition, etc. A series of advantages have enabled the arc ion plating technology to develop rapidly and be widely used, showing great economic benefits and industrial application prospects. Arc ion plating is a coating technology bas...

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Problems solved by technology

However, this method needs to add a complex mechanical control mechanism; at the same time, the position of the magnetic field is fixed and the intensity is difficult to adjust. It is only a mechanical movement that causes the change of the distributio

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