Inversion type OLED display device and preparation method thereof
A technology of devices and electroluminescent devices, which is applied in semiconductor/solid-state device manufacturing, electric solid-state devices, semiconductor devices, etc., can solve problems such as unsuitable mass production, difficulty in developing and synthesizing new materials, and difficult control of evaporation process, etc. achieve high efficiency
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Embodiment 1
[0037] 1) Device structure: Al / Li3N / Alq3 / NPB / HAT / Ag;
[0038] 2) Preparation of cathode structure:
[0039] In the vacuum chamber the pressure is 10 -4 Under the condition of Pa, 200nm Al is prepared by evaporation on the substrate first.
[0040] 3) Preparation of electron injection layer:
[0041] Keeping the pressure of the vacuum chamber constant, lithium nitride was decomposed under the conditions of evaporation rate of 0.05nm / s and evaporation temperature of 420°C to prepare a Li thin film as an electron injection layer material with a film thickness of 0.5nm.
[0042] 4) Preparation of organic light-emitting layer:
[0043] Keeping the pressure of the vacuum chamber constant, the electron transport layer, the light emitting layer, the hole transport layer, the hole injection layer, and the anode structure are sequentially evaporated.
[0044] In this embodiment, the organic layer is first vapor-deposited 50nm thick Alq 3 As the light-emitting layer and the electron...
Embodiment 2
[0048] 1) Device structure: ITO / Li 3 N / Alq3 / NPB / HAT / Ag
[0049] 2) Preparation of cathode structure;
[0050] Etch ITO into the corresponding pattern, as the cathode.
[0051] 3) Preparation of electron injection layer:
[0052] In the vacuum chamber the pressure is 10 -4 Under the condition of Pa, lithium nitride is used to decompose and prepare a Li thin film as an electron injection layer material under the conditions of an evaporation rate of 0.05nm / s and an evaporation temperature of 420°C, with a film thickness of 0.5nm.
[0053] 4) Preparation of organic light-emitting layer:
[0054] Keeping the pressure of the vacuum chamber constant, the electron transport layer, the light emitting layer, the hole transport layer, the hole injection layer, and the anode structure are sequentially evaporated.
[0055] In this embodiment, the organic layer is first vapor-deposited 50nm thick Alq 3 As the light-emitting layer and the electron transport layer, then vapor-deposit 65...
Embodiment 3
[0059] 1) Device structure: ITO / Li 3 N / Alq 3 / NPB / CuPc / ITO
[0060] 2) Preparation of cathode structure:
[0061] Etch ITO into the corresponding pattern, as the cathode.
[0062] 3) Preparation of electron injection layer:
[0063] In the vacuum chamber the pressure is 10 -4 Under the condition of Pa, lithium nitride is used to decompose and prepare a Li thin film as an electron injection layer material under the conditions of an evaporation rate of 0.05nm / s and an evaporation temperature of 420°C, with a film thickness of 0.5nm.
[0064] 4) Preparation of organic light-emitting layer:
[0065] Keeping the pressure of the vacuum chamber constant, the electron transport layer, the light emitting layer, the hole transport layer, the hole injection layer, and the anode structure are sequentially evaporated.
[0066] In this embodiment, the organic layer is first vapor-deposited 50nm thick Alq 3 As the light-emitting layer and the electron transport layer, then vapor-depos...
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