Plasma surface cleaning apparatus

A surface cleaning and plasma technology, used in cleaning methods and utensils, chemical instruments and methods, etc., can solve the problems of easy formation of water stains, easy shedding of thin films, easy shedding of coating layers, etc., to improve surface cleanliness and avoid two Less polluting, versatile effects

Inactive Publication Date: 2009-04-08
上海拓引数码技术有限公司
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  • Abstract
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  • Claims
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Problems solved by technology

[0003] Wet cleaning has the problem of incomplete cleaning, that is, it cannot completely remove organic matter and oxides on the glass surface, and it is easy to form water spots
Incomplete cleaning of the glass plated parts will directly lead to poor adhesion of the film layer, and the coated film layer is easy to fall off
[0004] In the large-area glass coating industry, such as the preparation of transparent conductive oxide films for the front electrodes of amor

Method used

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  • Plasma surface cleaning apparatus
  • Plasma surface cleaning apparatus
  • Plasma surface cleaning apparatus

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Embodiment Construction

[0025] In this embodiment, wet cleaning and ion cleaning are combined, that is, wet cleaning is performed first, and then plasma cleaning is performed, so that the cleaning effect is better, the surface cleanliness of the plated parts is high, the quality of the coated film layer is good, and the adhesion is strong. long life.

[0026] Such as figure 1 , figure 2 and image 3 As shown, the device for plasma surface cleaning in this embodiment includes a vacuum chamber 1 with an air inlet 11 and an air extraction port 12 opened thereon. A transfer roller 2 is installed in the vacuum chamber 1 . The glass substrate (plated piece) 7 to be cleaned is placed on the transfer roller 2 . A pair of metal plates 3, 4 are mounted on the upper and lower sides of the conveying roller 2 respectively, and the pair of metal plates 3, 4 are respectively connected to the positive and negative poles of a bias power supply 5. The bias power supply 5 can be a direct current or an intermediat...

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PUM

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Abstract

The invention discloses a plasma surface cleaning device, which comprises at least one vacuum cavity, a transmission device and a pair of metal plate, wherein the vacuum cavity is provided with an air intake and an exhaust port, the transmission device is arranged in the vacuum cavity, and the metal plate is arranged above and below the transmission device and is connected with positive and negative poles of a biasing power. The cleaning device can remove pollutant remained on plated pieces (glass) effectively and can avoid secondary pollution of the plasma surface without contacting air after cleaning.

Description

technical field [0001] The invention relates to a vacuum cleaning device. In particular, it belongs to the cleaning of plated parts (glass substrates) or workpiece surfaces before film deposition. Background technique [0002] In the vacuum coating process, the surface of the plated parts must be cleaned before being coated. The cleaning of glass-plated parts usually uses a combination of chemical cleaning and physical cleaning, that is, cleaning with a combination of lotion and brushing. This cleaning method is called wet cleaning for short. [0003] Wet cleaning has the problem of incomplete cleaning, that is, the organic matter and oxides on the glass surface cannot be completely removed, and water stains are easily formed. Incomplete cleaning of glass plated parts will directly lead to poor adhesion of the film layer, and the plated film layer is easy to fall off. [0004] In the large-area glass coating industry, such as the preparation of transparent conductive oxi...

Claims

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Application Information

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IPC IPC(8): B08B7/00
Inventor 陈彩刚夏芃施松林熊军刘古岩
Owner 上海拓引数码技术有限公司
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