Immersion liquid recovery vibration-damping control device used for photo-etching machine

Abstract

The invention discloses an immersion liquid recovery vibration reduction control device used in a lithography machine. The immersion liquid recovery vibration reduction control device is arranged between a projection lens set and a substrate, and consists of an upper end cover, an internal cavity body and a lower end cover. Sealing is realized by double-layer recovery and applying single-layer gas to the outside, and an isolation groove is arranged between the internal layer recovery and the external layer recovery, which causes most of the liquid and the gas to be respectively recovered by the internal layer and the external layer, thus realizing the primary gas-liquid separation. A secondary separation is carried out after the gas and the liquid enter a recovery cavity, and the gas and the liquid are respectively recovered by an internal gas recovery cavity and an external gas recovery cavity, and a liquid recovery cavity, thus shortening the existence period of the gas liquid two-phase flow, and reducing gas bubble, vibration and impact on an exposure flow field caused by the two-phase flow and the phase transition process.

Description

technical field [0001] The invention relates to an immersion liquid recovery and vibration reduction control device in an immersion lithography (Immersion Lithography) system, in particular to an immersion liquid recovery and vibration reduction control device for a photolithography machine. Background technique [0002] Modern lithography equipment is based on optical lithography, which uses an optical system to accurately project and expose the pattern on the mask to the substrate (such as: silicon wafer) coated with photoresist. It includes an ultraviolet light source, an optical system, a projection mask composed of chip patterns, an alignment system and a substrate covered with photosensitive photoresist. [0003] The immersion lithography system fills a certain liquid in the gap between the projection lens and the substrate, and increases the numerical aperture (NA) of the projection lens by increasing the refractive index (n) of the medium in the gap, thereby improvin...

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Problems solved by technology

[0008] (2). Control the pressure difference between the two ends of the recovery port (with orifice plate) within a small range. Although it reduces the sealing gas entering the recovery channel, it also inhibits the recovery of liquid and increases the possibility of liquid leakage.

[0009] (3). The gas-liquid separation and recovery method outside the recovery pipeline is far away from the source of the gas-liquid two-phase flow, and cannot effectively suppress the vibration caused by the gas-liquid two-phase mixed recovery at the recovery port and the interference to the gap flow field

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