VCSEL array device and manufacturing method thereof
A technology of devices and diode arrays, which is applied in the field of surface light-emitting semiconductor array devices, can solve problems such as internal stress faults, and achieve the effect of suppressing the increase of dislocations
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[0033]Embodiments of the selective oxidation VCSEL array device according to aspects of the present invention will be described below with reference to the accompanying drawings.
[0034] figure 1 is a schematic plan view of a selective oxidation VCSEL array device according to an embodiment of the present invention. exist figure 1 In the illustrated array device 20 , a plurality of mesa portions 24 (light emitting portions) are linearly arranged on a rectangular substrate 22 . On the substrate, eight mesa portions 24 can be formed at approximately constant intervals. On the substrate, a plurality of p-side electrodes 26 and a plurality of n-side electrodes 28 may be formed corresponding to the mesa portion 24 . The p-side electrode 26 is electrically connected to the p-type contact layer on top of the mesa portion 24 . The n-side electrode 28 is electrically connected to the n-type semiconductor layer of the mesa portion 24 . When a forward bias current is applied to t...
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