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154results about How to "Improve heat dissipation characteristics" patented technology

Silicon-based hybrid integrated laser array and preparation method thereof

The invention discloses a silicon-based hybrid integrated laser array and a preparation method thereof. The silicon-based hybrid integrated laser array comprises a plurality of distributed silicon-based hybrid integrated lasers in parallel integrated on an SOI substrate and an III-V semiconductor epitaxial layer. Each silicon-based hybrid integrated laser comprises: a silicon ridge waveguide; heatconducting layers located in special areas at two sides of the silicon ridge waveguide, wherein the special area is an area obtained after the SOI substrate removes a top silicon and a buried oxide layer; an intrinsic layer in a shape of a saddle and comprising a protrusion portion and a connection portion at two ends, wherein the protrusion portion at one end covers the upper portion of the heatconducting layers, the connection portion of the intrinsic layer is provided with an N-type waveguide layer, an active region and a P-type cover layer in order; an III-V waveguide formed by patterning the III-V semiconductor epitaxial layer and connected with the silicon ridge waveguide; a P-type ohmic contact layer; a P electrode; and an N electrode. The silicon-based hybrid integrated laser array is good in heat dissipation, simple and stable in preparation process, good in repeatability and low in manufacturing cost.
Owner:INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI

Deformation-free thermal extrusion method for helix slow-wave component preparation

InactiveCN101642865AInfluence of high frequency characteristicsWill not deformMetal working apparatusCold cathode manufactureMicrowaveRoom temperature
The invention discloses a deformation-free thermal extrusion method for helix slow-wave component preparation, which relates to the microwave device technology and is used for preparing a helix travelling wave tube component. The method comprises the following steps: placing and fixing a metal tube shell on an extrusion platform, feeding a helix and a medium clamping rod into an extrusion die, heating the tube shell firstly to increase the inside diameter of the tube shell, pushing the helix and the clamping rod of which positions are well fixed to the tube shell by using a push rod, then stopping heating, taking down the extrusion die, recovering the temperature of the whole component to the room temperature, and generating a great contraction force at the moment due to the contraction ofthe inside diameter of the tube shell to be applied to the helix and the clamping rod component to firmly extrude the both inside the tube shell so as to finish the preparation of the slow-wave component. Various dies required by the method can be prepared by machining of a linear cutting electro-discharge machine tool. The method not only can well improve the heat dissipation performance of theslow-wave component, but also can avoid the component structure deformation, dielectric performance reduction and high-frequency loss increment caused by the conventional assembly method.
Owner:INST OF ELECTRONICS CHINESE ACAD OF SCI

Method for improving thermal conduction capability of printed board of surface-mounted device

The invention provides a method for improving thermal conduction capability of a printed board of a surface-mounted device, and aims at providing an instructive and operable method for overcoming the defects that thermal conduction printed boards in the prior art are high in working temperature, poor in thermal reliability and the like due to poor thermal conduction capability, long thermal conduction route and large thermal conduction resistance. The technical scheme includes that the method includes: determining a layout of plated-through holes and thermal conductive copper pins according to ranges of power consumption parameters of a high-thermal-flux-density surface-mounted device; establishing a replicable and extendable thermal conducting route according to assembling relations among the surface-mounted device with a metal welding surface at the bottom, the printed board and a metal box; on reverse sides of thermal conductive through holes on the printed board and the surface-mounted device, sealing thermal conductive through holes with high temperature resistant adhesive tape; and respectively pressing the thermal conductive copper pins into correspondingly thermal conductive through holes and welding. By the method for improving the thermal conduction capability of the printed board of the surface-mounted device, the defect that the thermal conduction router of the high-thermal-flux-density surface-mounted device in low air pressure or vacuum is low in reliability is solved.
Owner:10TH RES INST OF CETC

Battery-case aluminium alloy plate exhibiting excellent moulding properties, heat-dissipation properties, and welding properties

Provided is a 3000 series aluminium alloy plate which exhibits heat-dissipation characteristics applicable to large lithium ion battery containers, and which also exhibits excellent moulding properties, shape fixability, and laser welding properties. This aluminium alloy plate is a cold-rolled annealed material which has: a component composition including over 0.2 mass% but less than 1.4 mass% of Fe, 0.5-2.0 mass% of Mn, over 0.2 mass% but not more than 1.1 mass% of Si, 0.05-1.0 mass% of Cu, and less than 0.05 mass% of Mg, the remainder comprising Al and impurities; a conductivity of over 45% IACS; a metallographic structure in which the number of second phase particles having an equivalent circular diameter of at least 2 µm is less than 1800/mm2; a 0.2% proof stress of at least 30 MPa but less than 85 MPa; and an elongation value of at least 10%. Otherwise, this aluminium alloy plate is a cold-rolled material which has: a conductivity of over 45% IACS; a metallographic structure in which the number of second phase particles having an equivalent circular diameter of at least 2 µm is less than 1800/mm2; a 0.2% proof stress of at least 90 MPa but less than 180 MPa; and an elongation value of at least 3%.
Owner:NIPPON LIGHT METAL CO LTD

Semiconductor device and manufacturing method thereof

The invention discloses a semiconductor device and a manufacturing method thereof. A first bonding layer and a second bonding layer of the semiconductor device are in contact with each other to provide bonding between a first wafer and a second wafer. The contact surface of the first bonding layer and the second bonding layer is a bonding surface. A first conductive channel and a second conductivechannel are connected to each other to provide an electrical connection between the first wafer and the second wafer. The first wafer further comprises a first pseudo channel penetrating through thefirst bonding layer, and the second wafer further comprises a second pseudo channel penetrating through the second bonding layer, wherein the first pseudo channel and the second pseudo channel are incontact with each other to improve the mechanical connection bonding force between the first wafer and the second wafer. According to the semiconductor device, the pseudo channels connected with eachother are formed in the bonding layers of the first wafer and the second wafer to improve the pattern distribution of the bonding surfaces of the first wafer and the second wafer, so that the bondingstrength and reliability are improved.
Owner:YANGTZE MEMORY TECH CO LTD

GaN power device based on ion implantation and manufacturing method thereof

The invention discloses a GaN power device based on ion implantation and a manufacturing method thereof. The GaN power device includes a GaN buffering layer, a GaN channel layer and an AiGaN barrier layer which are successively arranged from bottom to top. The A1GaN barrier layer is provided with an active electrode, a gate electrode and a drain electrode thereon, wherein the active electrode and the drain electrode are both ohmic contacts, the gate electrode is a Schottky contact, and all electrodes are covered with a passivation layer therebetween. The passivation layer is connected to the A1Gan barrier layer. The A1Gan barrier layer and the Gan channel layer are heterostructures and the interface between the A1Gan barrier layer and the Gan channel layer forms a 2D electron gas which acts as a transverse working conductive channel of the GaN power device due to polarization effects. An ion isolation region is formed by performing ion implantation on the bottom surface of the GaN buffering layer. The ion isolation region is disposed in the upper part of the GaN buffering layer and is connected to the GaN channel layer, and the GaN buffering layer is provided with an ion isolation region therein and then the bottom surface of the GaN buffering layer is bonded to a high heat conductive substrate. According to the invention, since an ion isolation region is formed by performing ion implantation, the GaN channel and the GaN buffering layer are isolated, such that current leakage is reduced and breakdown voltage is increased.
Owner:GUANGDONG INST OF SEMICON IND TECH

Preparation method of low-thermal-resistance gallium nitride high-electron-mobility transistor epitaxial material

The invention discloses a preparation method of a low-thermal-resistance gallium nitride high-electron-mobility transistor epitaxial material, and belongs to the technical field of semiconductor epitaxial materials. According to the invention, the method comprises the steps: employing high-temperature chemical vapor deposition equipment for carrying out high-temperature etching on the surface of a silicon carbide substrate, so the surface of the substrate presents controllable atomic-scale step morphology; carrying out the atomic-scale aluminum nitride nucleation on silicon carbide atomic steps by utilizing a metal organic chemical vapor deposition technology; transversely and rapidly combining the aluminum nitride nucleation points in an intermittent source supply mode, and performing layered deposition, so high-quality nanoscale aluminum nitride nucleation layer growth is achieved, and the gallium nitride high-electron-mobility transistor is prepared by taking aluminum nitride as a substrate. According to the method, the thickness of the aluminum nitride nucleating layer can be greatly reduced, the interface thermal resistance introduced by the aluminum nitride nucleating layer can be effectively reduced, the heat dissipation characteristic of the gallium nitride power device can be improved, and the method has extremely important significance for improving the power performance of the gallium nitride microwave power device.
Owner:NO 55 INST CHINA ELECTRONIC SCI & TECHNOLOGYGROUP CO LTD
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