Composition used for plating rhenium and use method thereof

Abstract

The invention discloses a composition used for plating rhenium and a use method thereof, in the composition, each liter of deionized water solution contains the following solutes: 10 to 30g of potassium rhenate, 3 to 9g of ammonium sulphate and 40 to 80g of nickel sulfate; and the use method thereof comprises the steps of: cleaning, cleaning and drying, annealing, acid cleaning, acid cleaning anddrying, electro-plating, and high-frequency annealing. Compared with the prior art, material required by plating rhenium is reduced by adding the nickel sulfate into the potassium rhenate and the ammonium sulphate, thus lowering temperature requirement in the membrane-plating process, reducing the current density, and effectively saving energy and material; and the formed plated membrane has goodadsorption and osmotic effect.

Description

technical field [0001] The invention belongs to the composition of electrochemical coating and its application method, in particular to the composition and application method of rhenium plating for molybdenum-made grid of grid-controlled traveling wave tube. Background technique [0002] In the electron gun of the grid-controlled traveling wave tube, the grid is designed in front of the cathode so that it can be modulated with a lower modulation voltage and power when the pulse is applied. Since the grid is in the core area of ​​the electron gun, its surface finish and the electrons inside it The emission will affect the shape of the electron beam of the electron gun, and seriously will directly affect the performance of the whole tube. At present, the surface of the grid is mostly coated with rhenium, a material with high work function. Due to the work function of molybdenum The work function of rhenium is 4.27ev, while the work function of rhenium is 5.1ev. At the same tim...

AI Technical Summary

Problems solved by technology

However, the composition of rhenium plating has always been potassium perrhenate, magnesium sulfamate, ammonium sulfate, sulfuric acid, and citric acid. The composition is relatively complex, and the pH is 1, which requires high requirements; during electroplating, the temperature is 70-80°C , the current density is 8~15A / dm 2 , because the temperature of the plating solution is higher than room temperature, the coating effect is not good, the current density is high, and energy is wasted