Fabricating method of soft template with nanometer structure

A nanostructure and manufacturing method technology, applied in the field of nanomanufacturing, can solve the problems of high manufacturing cost, restricting the research of nanoimprinting technology, long cycle, etc., and achieve the effects of convenient operation, low manufacturing cost and short cycle.

Inactive Publication Date: 2009-11-18
SHANGHAI NANOTECH PROMOTION CENT +1
View PDF0 Cites 18 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The commonly used template technology such as electron beam lithography has limited the resea

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Fabricating method of soft template with nanometer structure
  • Fabricating method of soft template with nanometer structure
  • Fabricating method of soft template with nanometer structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] 1. Porous anodized aluminum AAO is used, with a pore size of 100nm.

[0023] 2. Deposition of a layer of CF on AAO by gas-phase CVD 3 -(CF 2 ) 7 -(CH 2 ) 2 -SiCl 3 Antisticking agent.

[0024] 3. Mix the PDMS prepolymer and curing agent at a ratio of 10:1, then add 60% by weight of toluene, stir evenly with a glass rod, and degas under vacuum for 30 minutes to obtain a polymer.

[0025] 4. Coat the mixed polymer on the specific surface of AAO at 1000rmp / 30min, and degas for 5min.

[0026] 5. Then pour the degassed PDMS on the above polymer surface.

[0027] 6. Thermal curing at 100°C for 1 hour in vacuum.

[0028] 7. The polymer is peeled off from the AAO to obtain the replicated nanoimprint soft template.

Embodiment 2

[0030] 1. Porous anodized aluminum AAO is used, with a pore size of 100nm.

[0031] 2. Deposition of a layer of CF on AAO by gas-phase CVD 3 -(CF 2 ) 7 -(CH 2 ) 2 -SiCl 3 Antisticking agent.

[0032] 3. Mix 3.4g of VDT-731, 50μg of SIP6381.1, and 100μg of FlUKA87927, degas in vacuum for 5min, then add 1g of HMS-301 and mix well.

[0033] 4. Spin coat the above mixture at 1000rmp / 30min, and then cure at 60°C for 30min. A layer of h-PDMS polymer was obtained.

[0034] 5. Then pour the degassed PDMS on the above polymer surface.

[0035] 6. Thermal curing at 65°C in vacuum for 24 hours.

[0036] 7. The polymer is peeled off from the AAO to obtain the replicated nanoimprint soft template.

Embodiment 3

[0038] 1. Spin-coat PMMA on the Si wafer and heat at 180°C for 20min.

[0039] 2. Put the anti-adhesive treated AAO on the PMMA surface.

[0040] 3. Apply pressure on the AAO, the experimental parameters are 180°C / 50Torr / 5min.

[0041] 4. Release the mold to obtain a columnar structure on PMMA.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Apertureaaaaaaaaaa
Hole depthaaaaaaaaaa
Apertureaaaaaaaaaa
Login to view more

Abstract

The invention relates to a fabricating method of a soft template with a nanometer structure, which is characterized in that the soft template is duplicated by a porous anodic aluminum oxide template. The pore diameter of porous anodic aluminum oxide is usually 10-500 nm, holes of the porous anodic aluminum oxide are straight and are evenly distributed, the porous anodic aluminum oxide template can be used as a mother template and can be duplicated to form the soft template with high resolution and high duplication accuracy, therefore, the fabricating cost and the fabricating period of the template are reduced. The invention has the remarkable characteristics of low fabricating cost of the template, short period and simple process, and can realize large-area impression because the duplicated soft template can be repeatedly used.

Description

technical field [0001] The invention relates to a method for making a nano template, which belongs to the field of nano manufacturing. Background technique [0002] With the constraints of semiconductor processing optical lithography technology, nanoimprint technology has become an advantageous nano-fabrication technology to replace traditional optical lithography, with strong competitiveness and broad application prospects. Nano-suppression technology is to use a stamper with nano-patterns to press the polymer film on the substrate out of nano-scale patterns, and then perform conventional etching, peeling and other processing on the imprinted parts, and finally make nano-structures and devices. Nanoimprint technology can repeatedly prepare nanostructure patterns on large-area substrates in large batches, and the high-resolution patterns produced have fairly good uniformity and repeatability. The technology also has the advantages of low production cost, simplicity, and hig...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G03F7/00
Inventor 周伟民张静刘彦伯李小丽钮晓鸣宋志棠闵国全万永中施利毅封松林
Owner SHANGHAI NANOTECH PROMOTION CENT
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap