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Sio2 slurry for the production of quartz glass as well as the application of the slurry

A technology of silica and quartz glass, applied in glass forming, nanotechnology for materials and surface science, manufacturing tools, etc., can solve problems such as cracks, loss, and suboptimal fluidity coating technology

Active Publication Date: 2009-12-09
SHIN ETABU QUARTZ PRODS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0010] However it has been found that the fluidity of said known slurries is not optimal for some coating techniques
Especially in the case of highly filled slurries according to DE 10 2004 051 846 A1, "scratching" or scraping of the slurry material has proven to be problematic, and according to DE 103 19 300 A1 thin and non-sticky Although the dispersions are easy to pour, they run off immediately from the coated surface and are therefore only usable for flat coating geometries and only small layer thicknesses can be achieved. and prone to cracks during sintering

Method used

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  • Sio2 slurry for the production of quartz glass as well as the application of the slurry
  • Sio2 slurry for the production of quartz glass as well as the application of the slurry
  • Sio2 slurry for the production of quartz glass as well as the application of the slurry

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preparation example Construction

[0065] 1. Preparation of silicon dihydride slurry

[0066] image 3 Shown is the particle size distribution of the raw material components. It involves a multimodal particle size distribution with a relatively narrow particle size distribution maximum of about 30 microns (D 50 value), and a submaximum in the range of about 2 microns. D. 50 A raw material composition with a value of 30 microns is hereinafter referred to as R 30 .

[0067] Figure 4 The particle size distribution is shown as an REM photograph. It can be seen from the photo that each silica particle is structured into a spherical shape.

[0068] To prepare the slurry, other raw ingredients are added, which have a D of 5 microns, 15 microns and 40 microns 50 values ​​and their particle size distributions are otherwise identical to image 3 and Figure 4 The particle size distributions shown in are similar. The ingredients of the raw materials are in accordance with their D 50 values ​​are referred to...

Embodiment 1

[0091] Embodiment 1: Prepare the surface layer area of ​​diffuse reflection on the carrier

[0092] Use according to the invention easily spreadable silicon dioxide slurry, wherein the slurry layer is prepared using a knife (Abziehwerkzeug) tool (Abziehwerkzeug), and the knife tool is used for the metering and distribution of the slurry preparation effect.

[0093] The slurry stock is either deposited on the carrier surface or placed in a storage container from which the slurry can reach the carrier surface. The combination of the thixotropic properties of the slurries according to the invention results in a reduced viscosity under the action of the mechanical distribution of the knife coating tool, which makes it easier to flow out and spread the slurries on the surface of the carrier. This contributes to the possibility of producing equally uniform layers with a predetermined thickness.

[0094] Squeegee coating tools that move relative to the carrier surface are, for ex...

Embodiment 2

[0107] Embodiment 2: the preparation of quartz glass plate

[0108] A homogeneous slurry was prepared according to Recipe 3. This slurry was used to prepare quartz glass plates by the knife-coating method. Wherein a slurry layer with a thickness of 5 mm is prepared on the carrier. This is only possible based on the thixotropic flow properties of the slurry.

[0109] After drying of the layer (due to the high solids content and the alcohol-based dispersion liquid within a few hours) the layer is sintered. According to the sintering temperature and sintering time, thin plates made of transparent or opaque quartz glass can be obtained.

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Abstract

A known SiO2 slurry for the production of quartz glass contains a dispersion liquid and amorphous SiO2 particles with particle sizes to a maximum of 500 mum, wherein the largest volume fraction is composed of SiO2 particles with particle sizes in the range 1 mum-60 mum, as well as SiO2 nanoparticles with particle sizes less than 100 nm in the range 0.2-15% volume by weight (of the entire solids content). In order to prepare such a slurry for use, and to optimize the flow behavior of such a slurry with regard to later processing by dressing or pouring the slurry mass, and with regard to later drying and sintering without cracks, the invention suggests a slurry with SiO2 particles with a multimodal distribution of particle sizes, with a first maximum of the sizes distribution in the range 1mum-3 mum and a second maximum in the range 5 mum-50 mum, and a solids content (percentage by weight of the SiO2 particles and the SiO2 nanoparticles together) in the range 83%-90%.

Description

technical field [0001] The invention relates to a silica slurry for the production of quartz glass, which contains a dispersion liquid (Dispersionsflüssigkeit) and amorphous silica particles with a particle size of up to 500 μm, wherein the silica particles with a particle size in the range of 1 μm to 60 μm Silica particles account for the largest volume content, and the content of silica nanoparticles with a particle size of less than 100 nm is in the range of 0.2% to 15% by weight (accounting for the total solid content). [0002] Furthermore, the present invention also relates to specific uses of the silica slurry. [0003] The quartz glass to be produced is present in the form of a functional coating of a substrate (carrier) or in the form of an opaque or translucent quartz glass component, for example in the form of a ribbon-shaped or plate-shaped quartz glass component. Background technique [0004] Various techniques are known for producing flat quartz glass componen...

Claims

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Application Information

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IPC IPC(8): C03B19/06G02B5/02C03C17/02H05B3/00
CPCC03B20/00C03B19/06C03B19/066C03C17/02C03C2218/11G02B5/02B82Y30/00
Inventor W·维德克N·特瑞格J·韦伯
Owner SHIN ETABU QUARTZ PRODS
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