Processing method for copper target material
A processing method and technology for copper targets, which are applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of reduced performance of copper targets, inability to meet target requirements, rust, etc. Scratching, deformation reduction, cost reduction effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Example Embodiment
[0025] Reference figure 1 As shown, an embodiment of the method for processing a copper target of the present invention includes:
[0026] Step s1, fix the copper workpiece with a full-circle fixture, and perform the first machining;
[0027] Step s2, perform stress relief on the copper workpiece;
[0028] In step s3, the copper workpiece is fixed with a full-circle fixture, and the second machining is performed, the accuracy of which is higher than that of the first machining;
[0029] In step s4, the copper workpiece is fixed with a full-circle fixture, and the third machining is performed, the accuracy of which is higher than or equal to the second machining, and spray cooling is adopted.
[0030] In the above embodiment, the first machining process is rough machining, and its purpose is to remove most of the margin of the copper workpiece to obtain a more regular semi-finished product, that is, to cut the rough shape of the target material. The second machining is semi-finishing, a...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap