Quartz glass crucible and silicon single crystal pulling method using same
A technology of quartz glass crucible and silicon single crystal, which is applied in the directions of self-melting pulling method, single crystal growth, single crystal growth, etc. It can solve the problems of large influence of quartz glass and insufficient research on the influence of pores
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Embodiment 1~3、 comparative example 1~6
[0097] Using a quartz glass crucible (diameter of 28 inches) shown in Table 1, the silicon single crystal was pulled with a furnace pressure of 40 torr, an argon atmosphere, and a pulling time of 100 hr.
[0098] The results are shown in Table 1.
[0099] In addition, in Table 1, the inner surface crystallization ratio (%) is the proportion of crystalline silicon produced by crystallization of amorphous silicon on the inner surface of the crucible.
[0100] Open cell density (count / mm 2 ) is the inner surface density of the crucible in the concave part generated by open bubbles.
[0101] The rate of melting loss (μm / h) is the rate at which the thickness of the inner surface of the crucible decreases.
[0102] The void content rate (%) is the number of voids contained in one wafer.
[0103] Examples 1-3 are quartz glass crucibles of the present invention, and Comparative Examples 1-6 are quartz glass crucibles outside the scope of the present invention.
[0104] The inner s...
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