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Illuminating system

An illumination system and aspheric technology, applied in the field of microlithography, can solve the problems of insufficient reflection times, not an ideal point, and inability to couple the diffuser, and achieve the effects of increasing the number of reflections, prolonging life, and improving uniformity

Inactive Publication Date: 2010-02-03
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage of the lighting system in the prior art is that, because the light-emitting arc of the mercury lamp is not an ideal point, some light emitted by the mercury lamp is not emitted from the first focal point. When these lights are reflected by the ellipsoid reflector and the plane reflector Finally, due to factors such as angle and position, when participating in the homogenization of the homogenizer, it cannot be coupled into the homogenizer, or the number of reflections is not enough and the homogenization effect is not good

Method used

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Embodiment Construction

[0021] The following will combine Figure 3 ~ Figure 4 The lighting system of the present invention is further described in detail.

[0022] The lighting system of the present invention includes an aspheric reflector, a light source and a homogenizer;

[0023] The aspheric reflector, light source and homogenizer are arranged in sequence;

[0024] The light source is arranged at the first focal point of the aspheric reflector;

[0025] The light homogenizer is arranged on the main axis of the aspheric reflector, and the light emitted by the light source is reflected by the aspheric reflector and coupled into the incident end of the light homogenizer.

[0026] The lighting system of the present invention will now be described in detail with a specific embodiment.

[0027] see image 3 , the lighting system includes an aspheric reflector 2, a light source 3 and a quartz integrating rod 4, and the aspheric reflecting mirror 2, the light source 3 and the quartz integrating rod ...

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Abstract

The invention relates to an illuminating system comprising an aspherical reflector, a light source and a light homogenizer which are sequentially arranged. The light source is arranged on a first focus of the aspherical reflector; the light homogenizer is arranged on a main axis of the aspherical reflector; and light emitted by the light source is reflected by the aspherical reflector and is coupled to enter the incidence end of the light homogenizer. The illuminating system improves the uniformity of an illuminating field and has wide range of application.

Description

technical field [0001] The invention relates to microlithography technology, in particular to an illumination system. Background technique [0002] The microlithography technology in semiconductor manufacturing is to use the optical system to accurately project and expose the pattern on the mask onto the silicon wafer coated with photoresist. [0003] Such as figure 1 with figure 2 As shown, in the prior art, the illumination system of the optical system in the microlithography technology includes a standard ellipsoid reflector 11, a mercury lamp 12, a plane reflector 13 and a homogenizer 14, and the mercury lamp 12 is arranged on an ellipsoid On the first focal point of reflector 11, the light that mercury lamp 12 sends converges at one point after being reflected by ellipsoidal reflector 11 and plane reflector 13, and a homogenizer 14 ( figure 1 The homogenizer 14 is a quartz integrating rod, figure 2 The homogenizer 14 is a microlens array), and the light rays pass ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F21S2/00F21V7/04F21V5/00G03F7/20F21K9/68
Inventor 张祥翔
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD