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Low-temperature preparation method and application of vanadium dioxide film

The technology of vanadium dioxide and thin film is applied in the field of low-temperature preparation of vanadium dioxide thin film, which can solve the problems of high phase transition temperature and high synthesis temperature of vanadium dioxide thin film, and achieve the advantages of easy large-area preparation, low sintering temperature and convenient coating operation. Effect

Inactive Publication Date: 2010-08-18
SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In order to solve the problem of relatively high phase transition temperature and synthesis temperature of vanadium dioxide thin film, the invention discloses a method for preparing vanadium dioxide thin film by low-temperature liquid phase method, and the obtained thin film has the characteristic of phase transition near room temperature

Method used

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Experimental program
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Effect test

Embodiment 1

[0031] Preparation of Vanadium Dioxide Thin Film with Phase Transition Temperature of 42.1℃

[0032] (1) Preparation of coating solution:

[0033] Take 13.3 g of vanadyl acetylacetonate, dissolve it in 100 ml of a mixed solution of ethanol, ethylene glycol, chloroform, and water with a volume ratio of 2:4:1:1, stir in a magnetic stirrer for 3 hours, and age for 3 hours Finally, the coating solution of the vanadium dioxide thin film is obtained.

[0034] (2) Clean the substrate:

[0035] Select the substrate as quartz glass, and use the standard RCA process to clean it to remove organic matter, dust and metal ion impurities on the surface. After that, put the substrate into a 60°C oven for drying treatment before use.

[0036] (3) Coating solution coating

[0037] Select the coating solution obtained in the above step (1), and use a spin coater for coating. The spin coating speed and time are as follows: first, the low speed is 200 rpm, and it is kept for 10 seconds; then,...

Embodiment 2

[0043] Preparation of Vanadium Dioxide Thin Film with Phase Transition Temperature of 67.3℃

[0044] (1) Preparation of coating solution:

[0045] Take 13.3 g of vanadyl acetylacetonate, dissolve it in 100 ml of a mixed solution of ethanol, ethylene glycol, chloroform, and water with a volume ratio of 2:4:1:1, stir in a magnetic stirrer for 3 hours, and age for a week A coating solution for the vanadium dioxide thin film is obtained.

[0046] (2) Clean the substrate:

[0047]Select the substrate as quartz glass, and use the standard RCA process to clean it to remove organic matter, dust and metal ion impurities on the surface. Afterwards, the substrate was dried in an oven at 60°C for use.

[0048] (3) Coating solution coating

[0049] Select the coating solution obtained in the above step (1), and use a spin coater for coating. The spin coating speed and time are as follows: first, the low speed is 200 rpm, and it is kept for 10 seconds; then, the high speed is 3000 rpm,...

Embodiment 3

[0054] Preparation of Vanadium Dioxide Thin Films Sintered at 250℃

[0055] (1) Preparation of coating solution:

[0056] Take 13.3 g of vanadyl acetylacetonate, dissolve it into 100 ml of a mixed solution of ethanol, ethylene glycol, chloroform, and water with a volume ratio of 2:4:1:1, stir in a magnetic stirrer for 3 hours, and obtain after aging for one week Coating solution for vanadium dioxide thin film.

[0057] (2) Clean the substrate:

[0058] Select the substrate as quartz glass, and use the standard RCA process to clean it to remove organic matter, dust and metal ion impurities on the surface. Afterwards, the substrate was dried in an oven at 60°C for use.

[0059] (3) Coating solution coating

[0060] Select the coating solution obtained in the above step (1), and use a spin coater for coating. The spin coating speed and time are as follows: first, the low speed is 200 rpm, and it is kept for 10 seconds; then, the high speed is 3000 rpm, and it is kept for 30 ...

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Abstract

The invention belongs to the field of chemical functional materials, relating to a low-temperature preparation method and application of a vanadium dioxide film. The preparation method adopts vanadyl acetylacetonate with low toxicity as a reactant; at the temperature of 250 DEG C -750 DEG C, the vanadium dioxide film with phase change characteristics is obtained under the condition of controlling sintering atmosphere. The phase change temperature of the film can be adjusted to be approached to the room temperature. The method has small energy consumption, simple preparation technology and favorable safety; and the obtained vanadium dioxide film has low sintering temperature and is suitable for industrial production in a large scale.

Description

technical field [0001] The invention relates to a low-temperature preparation method of a vanadium dioxide thin film, in particular to a vanadium dioxide (VO 2 ) film preparation process and the application of the film belong to the field of chemical functional materials. Background technique [0002] Vanadium dioxide (VO 2 ) is a metal oxide with phase transition properties. The phase transition temperature of vanadium dioxide bulk single crystal material is about 68°C. As the temperature increases, vanadium dioxide transforms from a semiconductor with a monoclinic structure to a metallic state with a tetragonal structure. The corresponding physical quantities, including optical, electrical, and magnetic properties, undergo mutations. Since Bell Labs first discovered vanadium dioxide in the late 1950s, research based on its unique properties has attracted widespread interest from scientific and industrial circles in various countries. So far, vanadium dioxide materials...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/23
Inventor 高彦峰张宗涛杜靖康利涛罗宏杰
Owner SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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