The invention discloses a method for synchronously regulating and controlling the optical frequency
dielectric property and the
phase transition temperature of a
vanadium oxide film, and aims to solve the technical problems that in a process for preparing a VO2 film by using a magnetron
sputtering technology, the composition of a VOx
mixed phase is very sensitive to
oxygen flow, and the stability of the VO2 film preparation process is poor. The regulation method comprises the following steps: 1, ultrasonically cleaning the substrate; 2, cleaning a
metal target material; thirdly, the V
metal target material is connected with a direct-current power source, and the W
metal target material is connected with a radio-frequency power source; 4, vacuumizing; 5, heating the substrate; 6, performing luminance build-up; seventhly, the target material is subjected to pre-
sputtering treatment; 8, controlling the
oxygen flow to enable the
coating state to be in a poisoning mode, and performing film deposition; 9, cooling; 10, vacuumizing in an annealing furnace; and 11, annealing treatment. By introducing W atoms, the
crystal structure and the energy band structure of VO2 are regulated and controlled, and meanwhile, the
electronegativity of W and V elements and the difference of atomic radiuses are fully utilized, so that synchronous regulation and control of microcosmic
electron polarization response and optical frequency
dielectric characteristics are realized.