Device and method for continuous purification reaction treatment of monocrystalline silicon or polycrystalline silicon produced from silicon ore
A processing device and processing method technology, applied in chemical instruments and methods, single crystal growth, single crystal growth and other directions, can solve the problems of lack of suitable methods and structures, inconvenience and other problems in the device and method of single crystal silicon or polycrystalline silicon, and achieve The effect of increasing the yield of silicon crystal processing, reducing emission pollution, and improving purity
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[0032] In order to further illustrate the technical means and effects that the present invention adopts to achieve the intended purpose of the invention, below in conjunction with the accompanying drawings and preferred embodiments, the monocrystalline silicon or polycrystalline silicon continuous purification reaction treatment device and The specific implementation, method, steps, structure, features and effects of the method are described in detail below.
[0033] The aforementioned and other technical contents, features and effects of the present invention will be clearly presented in the following detailed description of the preferred embodiments with reference to the drawings. Through the description of the specific implementation mode, a more in-depth and specific understanding of the technical means and effects adopted by the present invention to achieve the intended purpose can be obtained. However, the accompanying drawings are only for reference and description, and ...
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