Novel coplanar microcavity plasma device with aluminium substrate
A plasma and aluminum substrate technology, applied in solid cathode parts, cold cathode tubes, etc., can solve the problems of unstable weak ionization plasma, easy arc discharge, etc., achieve good application prospects, simplify production processes, and improve luminescence. The effect of efficiency
Inactive Publication Date: 2011-06-29
XI AN JIAOTONG UNIV
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[0002] Weakly ionized plasma near conventional atmospheric pressure is very unstable and is particularly prone to arc discharge
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[0026] figure 1 Shown is a three-dimensional cross-sectional view of the discharge cell structure of a new type of coplanar microcavity plasma device with a circular aluminum substrate. In the figure, 100 is an alumina wall, 110 is a microcavity unit, 140 is a left sustain electrode, and 150 is a right sustain electrode. It is realized in this way: select pure aluminum or aluminum alloy with a thickness of 50-200 microns, first use surface grinding, mechanical polishing and other methods to make the surface smooth and flat; The patterned template is used for photolithography, and the places that do not need to be drilled are protected with photoresist; then, the electrochemical etching method is used to etch with an etching solution such as hydrochloric acid, sulfuric acid or phosphoric acid, and a constant current is added. Through holes are etched in places not protected by photoresist, and the photoresist is removed after etching, so that a microcavity through hole unit is...
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Abstract
The invention discloses a novel coplanar microcavity plasma device with aluminium substrate. The device is characterized in that the device takes pure aluminium or aluminium alloy as the substrate; cylindrical microcavity through-hole units are arrayed; the space between the rows in the array is more than the space between the columns in the array; an isotropous alumina film layer is arranged around each microcavity through-hole unit; the thickness of the alumina film layer is more than the space between the columns in the array and is less than the space between the rows; the space between the two adjacent microcavity through-hole units in each row is completely filled with the alumina film layer while only a part between the microcavity through-hole units in the two adjacent rows is filled with the alumina film layer, thus forming the coplanar electrode structure; the residual aluminium layers between the microcavity through-hole units in each row serve as the sustaining electrodes and are buried in dielectric layers of the alumina film layers to be well protected, so driving voltage can be applied to the upper and lower sides of the microcavity through-hole units in each row to realize dielectric barrier discharge.
Description
technical field [0001] The invention proposes a novel coplanar microcavity plasma device with an aluminum substrate. The discharge unit structure of the device is based on pure aluminum or aluminum alloy, and the characteristic size is below 200 microns. Background technique [0002] Weakly ionized plasmas near conventional atmospheric pressure are very unstable and are particularly prone to arcing. However, by confining the working gas to a micron-scale space, a stable glow discharge can be generated. Such discharges are commonly referred to as "microplasmas", also known as "microcavity plasmas". The discharge size of microcavity plasma devices is generally between 10 μm and 150 μm, and the discharge type belongs to dielectric barrier discharge. The size of the microcavity in early devices is generally hundreds of microns, and has recently been reduced to tens of microns, and there is a tendency to reduce to less than ten microns. Microplasmas have unique characteristics...
Claims
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Login to View More IPC IPC(8): H01J17/49H01J17/16
Inventor 梁志虎张小宁王含何兆刘纯亮
Owner XI AN JIAOTONG UNIV