Device and method for purifying high-temperature-resistant resin
A purification method and purification device technology are applied in the field of purification devices for high temperature resins, which can solve the problems of high operation risk, complex equipment and high cost, and achieve the effects of simple equipment structure, simple and convenient operation, and reduced raw material cost.
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[0034] Example 1
[0035] A high-temperature polymer purification device, characterized in that the heating tank body 1 is connected to the washing tank body 2 through a valve 8, the washing tank body 2 is equipped with a rotating drum 3, and the lower end of the washing liquid storage tank 4 is connected through a valve 7 The upper end of the washing tank body 2 is connected to the upper cover of the heating tank body 1 through a pipeline 6, the upper end of the washing liquid storage tank 4 is equipped with a condenser 5, and the upper end of the washing tank body 2 is provided with a feeding port 10. The rotating drum 3 is a stainless steel cylinder with dense small holes. The drum is lined with filter cloth. The rotating drum can be freely rotated forward or backward through program control; the heating tank 1 and washing tank 2 are equipped with heating devices, The washing tank 2 also has a vacuum device.
[0036] A method for purifying high temperature resistant polymer, in...
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[0045] Example 2
[0046] In step f, the temperature in the tank body is raised to 100°C for drying; the polymer content in the mixture of polymer and washing solvent in the washing tank body 2 is 20% by weight; the rotating speed of the drum 3 in the washing tank body 2 is washing It is 200 rpm for material, 4000 rpm for removing solvent by centrifugation, and 50 rpm for drying. The remaining steps are the same as the first embodiment.
[0047] In order to determine the purification effect of the device of the present invention, the specific purification method is now operated, and the measurement method is inductively coupled plasma atomic emission spectroscopy (ICPAES) in ppm.
[0048] (1) Purification of polyether ether ketone (PEEK) resin prepared with sulfolane as solvent
[0049] Take 20kg of the above-mentioned polyetheretherketone and 200kg of deionized water, put them into a washing tank, wash at 80℃, after 40 minutes each time, after centrifugation to remove most of the wa...
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