Clamping apparatus for flushing photomask

A card mounting device and photomask technology, which is applied in the photomechanical process of photomechanical processing of originals, optics, and pattern surfaces, etc., can solve the problems of inability to use cleaning technology, large volume, affecting cleaning efficiency, etc. To achieve the effect of reducing installation and debugging time, reasonable and compact structure

Active Publication Date: 2011-10-26
CHANGZHOU RUIZE MICROELECTRONICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, some devices for automatically grasping photomasks are disclosed, which are large in size and cannot be horizontally grasped, placed and turned over in the cleaning tank, and

Method used

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  • Clamping apparatus for flushing photomask
  • Clamping apparatus for flushing photomask
  • Clamping apparatus for flushing photomask

Examples

Experimental program
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Example Embodiment

[0018] see Figure 1~6 As shown, the clamping device for photomask flushing of the present invention includes a workbench 1 and an opening and closing drive mechanism and an automatic turning mechanism installed on the workbench 1. The workbench 1 of the present invention is provided with an aperture 1-1 , The workbench 1 is set on the top of the cleaning bin. On the top of the cleaning bin, the photomask 20 is grasped, turned and placed by the card loading device of the present invention, and the cleaning liquid sprayed from the nozzles is applied to both sides of the photomask 20 Perform cleaning.

[0019] see Figure 1~4 As shown, the opening and closing drive mechanism of the present invention includes two guide rail seats 5 diagonally arranged along the worktable 1, a drive assembly and a synchronization assembly respectively installed on the two guide rail seats 5. The drive assembly includes an air cylinder 10, a linear guide 11 and a transition The sliding block 6 and the...

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PUM

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Abstract

The invention relates to a clamping apparatus for flushing photomask. The folding driving mechanism comprises two guide rail seats diagonally arranged along a workbench, a driving assembly and a synchronizing group respectively arranged on two guide rail seats, a cylinder and a linear guide rail of a driving assembly is arranged on the guide rail seat, a transitional slide block arranged on a cylinder is connected with a supporting plate through a compaction spring and a force cell sensor, a synchronous belt of the synchronizing group is engaged with each guide gear, a supporting plate is connected with the synchronous belt; a driving turnover mechanism comprises an active turnover group and a driven turnover group, a driving fulcrum bearing and a passive fulcrum bearing are respectively arranged on the supporting plate, an active jaw seat connected with an oscillating cylinder is arranged on a driving fulcrum bearing through an driving shaft sleeve, the driving jaw seat is detachably arranged on the driving jaw seat; the passive jaw seat is arranged on the passive fulcrum bearing through the driven shaft sleeve, the passive jaw is detachably arranged on the passive jaw seat, a center line of the passive jaw is superposed with a center line of the passive jaw. The invention is characterized in that the structure is reasonable, two jaws can be moved forward or backward together, and grabbing and disposing are reliable.

Description

technical field [0001] The invention relates to a clamping device for photomask flushing, which belongs to the technical field of semiconductor manufacturing. Background technique [0002] A "photomask" is a stencil used to mass print circuits in the manufacture of integrated circuit chips. Through the photolithography process, the circuit patterns on the photomask are printed in large quantities on the silicon wafer. Therefore, any defect on the photomask will have a great impact on the yield of the chip. [0003] During the manufacturing process of the photomask, after the photomask is exposed and developed, the photoresist on the surface needs to be removed. Therefore, the photomask needs to be cleaned. Conventionally, the photomask is placed in a relatively closed process treatment cabin, which is in a clean atmosphere, the photomask is placed on the positioning seat in the process treatment cabin, and the photomask is rotated by the motor. , to clean both sides of t...

Claims

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Application Information

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IPC IPC(8): G03F1/00B08B13/00
Inventor 吉保国
Owner CHANGZHOU RUIZE MICROELECTRONICS
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