Controlled silicon device provided with secondary conductive path and triggered with help of diodes
A diode-assisted, secondary conduction technology, applied in diodes, semiconductor devices, electric solid-state devices, etc., can solve problems such as latch-up effect and low clamping voltage, and achieve uniform current, simple structure, and optimized connection and layout.
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[0021] The present invention will be described in detail below in conjunction with the embodiments and accompanying drawings, but the present invention is not limited thereto.
[0022] Such as figure 2 As shown, a diode-assisted triggering thyristor device with a secondary conduction path includes a P-type substrate 21, wherein the P-type substrate 21 is sequentially provided with a first P+ implant region 22, a first N+ implant region region 23, the first N well 24, the second N well 25 and the third N well 26; the first N well 24 is provided with a second P+ implant region 24a, a second N+ implant region 24b and a third P+ implant region 24c in sequence A fourth P+ implantation region 25a and a third N+ implantation region 25b are sequentially provided on the second N well 25, and a fifth P+ implantation region 26a and a fourth N+ implantation region 26b are sequentially provided on the third N well 26;
[0023] The first P+ implantation region 22, the first N+ implantatio...
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