Dynamic gas distributing system for standard gas
A technology of standard gas and diluent gas, which can be used in gas and gas/vapor mixing, mixer accessories, dissolution, etc., and can solve problems such as large consumption of diluent gas.
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Embodiment 1
[0031] Example 1: Using figure 1 A dynamic gas distribution device to configure about 400ppb hydrogen sulfide standard gas in high-purity nitrogen
[0032] Using high-purity nitrogen as the carrier gas and dilution gas source 1, the high-purity nitrogen passes through the pressure regulator valve 2 to control the pressure; the mass flow controller 3 controls the flow of the carrier gas passing through the diffusion cell 5; the mass flow controller 4 controls the flow of the dilution gas; The hydrogen sulfide permeation tube 6 is placed in the diffusion cell 5 at 45°C, and its permeation rate is 0.763 μg / min; the flow controller 7 controls the forced vent flow; therefore, the hydrogen sulfide concentration at outlets 10 and 11 can be obtained by the following calculation:
[0033] The mass rate of hydrogen sulfide entering the mixing chamber 9 is calculated by the following formula:
[0034] q = β M · ...
Embodiment 2
[0049] Example 2: Using figure 1 A dynamic gas distribution device to configure about 50ppb hydrogen sulfide standard gas in high-purity nitrogen
[0050] Operation and parameter are the same as embodiment 1, just change following parameter: vent flow is F 7 = 90ml / min. Results: The theoretical concentration of hydrogen sulfide standard gas at outlets 10 and 11 is 53.5ppb; the concentration of gas at outlet 11 is analyzed by a total sulfur analyzer, and the concentration is 51.3ppb, and the relative deviation between the two is 4.1%.
[0051] As mentioned above, when only by adjusting the dilution gas flow F 4To obtain a lower concentration of standard gas, it is often necessary to adjust the dilution gas flow to a large extent, even exceeding the capacity of the system pipeline. In contrast, the present invention can simply and quickly obtain standard gases with a wide range of concentrations by adjusting the flow controller 7 .
Embodiment 3
[0052] Example 3: Using figure 2 A dynamic gas distribution device to configure about 400ppb hydrogen sulfide standard gas in high-purity nitrogen
[0053] Using high-purity nitrogen as the carrier gas and dilution gas source 1, the high-purity nitrogen passes through the pressure regulator valve 2 to control the pressure; the mass flow controller 3 controls the flow of the carrier gas passing through the diffusion cell 5; the mass flow controller 4 controls the flow of the dilution gas; The flow controller 7 controls the flow rate of forced venting; the hydrogen sulfide permeation tube 6 is placed in the diffusion cell 5 at 45°C, and its permeation rate is 0.763 μg / min; the flow regulating valve 10 controls the dilution gas flow rate entering the mixing chamber 9';
[0054] The mass rate of hydrogen sulfide entering the mixing chamber 9 is calculated by the following formula:
[0055] q = β M · ...
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